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arXiv 0801.1840cond-mat.mtrl-sci
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Mn掺杂III-V半导体金属区的输运

Transport in the metallic regime of Mn doped III-V Semiconductors

Louis-Francois Arsenault, B. Movaghar, P. Desjardins, A. Yelon

摘要:

对GaAs中锰掺杂的标准模型进行了相干势近似(CPA)处理。输运系数内的线性响应Kubo形式主义进行评估。正常(NHE)和异常的贡献(AHE)的霍尔效应的检查。我们用一个简单的态密度模型来描述未掺杂的价带。CPA带结构演变成自旋分裂带所造成的$p-d$交换散射与Mn掺杂剂。这产生了强的磁阻,其随温度急剧下降。电阻的温度($T$)依赖性是由于自旋无序散射(随$T$增加)、CPA能带结构重整化和带电杂质散射(随$T$减少)。计算出的传输系数进行了讨论,与实验有关,以评估整体趋势,并决定该模型是否描述了正确的物理。这看起来确实是这样的,记住跳频限制需要单独处理,因为它不能在带CPA内描述。

英文摘要:

The standard model of Mn doping in GaAs is subjected to a coherent potential approximation (CPA) treatment. Transport coefficients are evaluated within the linear response Kubo formalism. Both normal (NHE) and anomalous contributions (AHE) to the Hall effect are examined. We use a simple model density of states to describe the undoped valence band. The CPA bandstructure evolves into a spin split band caused by the $p-d$ exchange scattering with Mn dopants. This gives rise to a strong magnetoresistance, which decreases sharply with temperature. The temperature ($T$) dependence of the resistance is due to spin disorder scattering (increasing with $T$), CPA bandstructure renormalization and charged impurity scattering (decreasing with $T$). The calculated transport coefficients are discussed in relation to experiment, with a view of assessing the overall trends and deciding whether the model describes the right physics. This does indeed appear to be case, bearing in mind that the hopping limit needs to be treated separately, as it cannot be described within the band CPA.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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