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arXiv 2501.09427cond-mat.mtrl-sci
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原子尺度下$\beta$-Ga$_{2}$O$_{3}$ (100) 晶面的边相关台阶流生长机制

Edge-Dependent Step-Flow Growth Mechanism in $β$-Ga$_{2}$O$_{3}$ (100) Facet at the Atomic Level

Qi Li, Junlei Zhao, Na Lin, Xiufeng Cheng, Xian Zhao, Zhaojun Liu, Zhitai Jia, Mengyuan Hua

AI总结:

本研究通过机器学习分子动力学模拟与密度泛函理论,揭示了$\beta$-Ga₂O₃(100)晶面的台阶流生长机制及切斜方向对孪晶界形成的影响,为其同质外延及类似体系生长提供参考。

摘要:

高质量$\beta$-Ga$_{2}$O$_{3}$薄膜的同质外延台阶流生长对高性能Ga₂O₃基器件的发展至关重要。本研究通过机器学习分子动力学模拟与密度泛函理论计算,探究了$\beta$-Ga$_{2}$O$_{3}$ (100) 晶面的台阶流生长机制。结果表明,Ga吸附原子与Ga-O吸附原子对具有高迁移率,是(100)晶面表面高效迁移的主要原子种类。$\beta$-Ga$_{2}$O$_{3}$的不对称单斜结构在[00$\overline{1}$]台阶边处为Ga吸附原子诱导出明显的两阶段Ehrlich-Schwoebel势垒,有助于抑制双台阶与小丘的形成。此外,向[00$\overline{1}$]方向的切斜不会诱导稳定孪晶界成核,而向[001]方向的切斜会导致孪晶界自发形成。该研究不仅为高质量$\beta$-Ga$_{2}$O$_{3}$同质外延提供了有价值的见解,也为其他类似体系的台阶流生长机制提供了参考。

英文摘要:

Homoepitaxial step-flow growth of high-quality $β$-Ga$_{2}$O$_{3}$ thin films is essential for the advancement of high-performance Ga$_{2}$O$_{3}$-based devices. In this work, the step-flow growth mechanism of $β$-Ga$_{2}$O$_{3}$ (100) facet is explored by machine-learning molecular dynamics simulations and density functional theory calculations. Our results reveal that Ga adatoms and Ga-O adatom pairs, with their high mobility, are the primary atomic species responsible for efficient surface migration on the (100) facet. The asymmetric monoclinic structure of $β$-Ga$_{2}$O$_{3}$ induces a distinct two-stage Ehrlich-Schwoebel barrier for Ga adatoms at the [00$\overline{1}$] step edge, contributing to the suppression of double-step and hillock formation. Furthermore, a miscut towards [00$\overline{1}$] does not induce the nucleation of stable twin boundaries, whereas a miscut towards [001] leads to the spontaneous formation of twin boundaries. This research provides meaningful insights not only for high-quality $β$-Ga$_{2}$O$_{3}$ homoepitaxy but also the step-flow growth mechanism of other similar systems.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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