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arXiv 2410.03493cond-mat.mes-hallcond-mat.mtrl-scicond-mat.str-el
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表征拓扑绝缘体 (Bi$_{1-x}$Sb$_x$)$_2$Te$_3$ 薄膜中的化学势无序

Characterizing the chemical potential disorder in the topological insulator (Bi$_{1-x}$Sb$_x$)$_2$Te$_3$ thin films

Jens Brede, Mahasweta Bagchi, Adrian Greichgauer, Anjana Uday, Andrea Bliesener, Gertjan Lippertz, Roozbeh Yazdanpanah, Alexey Taskin, Yoichi Ando

AI总结:

利用扫描隧道显微镜和能谱学研究拓扑绝缘体薄膜的化学势无序,发现电势涨落与 Landau level 展宽正相关,并确定 $x\approx 0.65$ 可实现较低涨落和理想 Dirac point 位置。

摘要:

我们使用扫描隧道显微镜和能谱学,在超高真空和低至 1.7 K 的条件下,研究了具有不同 Sb 浓度 $x$ 的拓扑绝缘体 (Bi$_{1-x}$Sb$_x$)$_2$Te$_3$ 薄膜(厚度 7 - 30 nm)表面化学势的局部变化,以深入了解在补偿型拓扑绝缘体薄膜中形成的电荷 puddles。我们发现,对于准体导电薄膜,电势涨落幅度 $Γ$ 在 5 到 14 meV 之间,而对于体绝缘薄膜,该值约为 30 - 40 meV。涨落的长度尺度 $λ$ 被发现跨越 13 - 54 nm 的范围,与 $Γ$ 没有明确的相关性。施加垂直于表面的磁场,我们观察到二维拓扑表面态凝聚成 Landau levels,并发现 $Γ$ 与 Landau-level 峰的光谱宽度之间存在微弱但正相关的相关性,这表明由漂移运动引起的量子涂抹是 Landau level 展宽的来源。我们的系统测量为实现具有可接受电势涨落水平的 $(\mathrm{Bi}_{1-x}\mathrm{Sb}_x)_2\mathrm{Te}_3$ 薄膜提供了有用的指导。特别是,我们发现 $x\approx 0.65$ 实现了这样一种情况:$Γ$ 显示出 14 meV 的相对较小值,且 Dirac point 位于 Fermi energy 的 $\sim$10 meV 范围内。

英文摘要:

We use scanning tunneling microscopy and spectroscopy under ultra-high vacuum and down to 1.7 K to study the local variations of the chemical potential on the surface of the topological insulator (Bi$_{1-x}$Sb$_x$)$_2$Te$_3$ thin films (thickness 7 - 30 nm) with varying Sb-concentration $x$, to gain insight into the charge puddles formed in thin films of a compensated topological insulator. We found that the amplitude of the potential fluctuations, $Γ$, is between 5 to 14 meV for quasi-bulk conducting films and about 30 - 40 meV for bulk-insulating films. The length scale of the fluctuations, $λ$, was found to span the range of 13 - 54 nm, with no clear correlation with $Γ$. Applying a magnetic field normal to the surface, we observe the condensation of the two-dimensional topological surface state into Landau levels and find a weak but positive correlation between $Γ$ and the spectral width of the Landau-level peaks, which suggests that quantum smearing from drift motion is the source of the Landau level broadening. Our systematic measurements give useful guidelines for realizing $(\mathrm{Bi}_{1-x}\mathrm{Sb}_x)_2\mathrm{Te}_3$ thin films with an acceptable level of potential fluctuations. In particular, we found that $x\approx 0.65$ realizes the situation where $Γ$ shows a comparatively small value of 14 meV and the Dirac point lies within $\sim$10 meV of the Fermi energy.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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