arXiv 2301.077122023-01-18physics.opticscond-mat.mtrl-sciphysics.ins-det

薄膜异质结构中Refractive Indices的精确测量

Precise Measurement of Refractive Indices in Thin Film Heterostructures

Lukas W. Perner, Gar-Wing Truong, David Follman, Maximilian Prinz, Georg Winkler, Stephan Puchegger, Garrett D. Cole, Oliver H. Heckl

备注：: 13 pages, 3 figures, submitted to PRL

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摘要：

我们提出了一个强大的，精确的，准确的方法来同时测量两个透明材料的折射率内的干涉涂层。这是通过测量光度精确的透射光谱和薄膜多层结构的生长态单层厚度来实现的。这些测量用于基于TM的曲线拟合例程，该例程通过Monte-Carlo型误差传播提取折射率及其测量不确定性。我们证明了这种方法的性能，通过实验测量的折射率，GaAs和Al $_{0.929}$ Ga $_{0.071}$ As，存在于外延分布布拉格反射器。可以使用各种装置来获得透射光谱（例如，FTIR，基于光栅的分光光度计）和层厚度（例如，SEM、TEM、AFM），所讨论的方法易于适用于几乎任何波长区域和许多感兴趣的透明材料组合。随后的模型拟合方法产生折射率值与$10^{-4}$级的不确定性为两种材料。

英文摘要：

We present a robust, precise, and accurate method to simultaneously measure the refractive indices of two transparent materials within an interference coating. This is achieved by measuring both a photometrically accurate transmittance spectrum and the as-grown individual layer thicknesses of a thin-film multilayer structure. These measurements are used for a TMM-based curve-fitting routine which extracts the refractive indices and their measurement uncertainties via a Monte-Carlo-type error propagation. We demonstrate the performance of this approach by experimentally measuring the refractive indices of both, GaAs and Al$_{0.929}$Ga$_{0.071}$As, as present in an epitaxial distributed Bragg reflector. A variety of devices can be used to obtain the transmittance spectrum (e.g., FTIR, grating-based spectrophotometer) and layer thicknesses (e.g., SEM, TEM, AFM), the discussed approach is readily adaptable to virtually any wavelength region and many transparent material combinations of interest. The subsequent model-fitting approach yields refractive index values with $10^{-4}$-level uncertainty for both materials.

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