4 H- SiC中浅、深硼缺陷理论
Theory of shallow and deep boron defects in 4H-SiC
摘要：
摘要尽管在提高$p$型4 H-SiC衬底和层的质量方面取得了进展，但我们仍然没有能够解释文献中大量与硼相关的光学、结和顺磁共振实验的模型。一个突出的难题是观察到两个浅的硼缺陷，而不同的轴向取向所发现的电子顺磁共振（EPR）和电子核双共振（ENDOR）数据。在掺杂有其他III族元素的材料中没有观察到该特征。另一个悬而未决的问题涉及相互矛盾的结论，从光致发光和EPR研究更深的硼中心，这已被链接到相当不同的模型，无论是基于替代或空位相关的硼缺陷。我们解开这些和其他问题的第一性原理计算，其中的温度依赖的稳定性，电子活动，和顺磁响应的硼缺陷在4 H-SiC的调查。
英文摘要：
Abstract Despite advances toward improving the quality of $p$-type 4H-SiC substrates and layers, we still have no model capable of accounting for the multitude of boron-related optical, junction, and paramagnetic resonance experiments available in the literature. A conspicuous puzzle is the observation of two shallow boron defects with rather distinct axial orientations as found by electron paramagnetic resonance (EPR) and electron nuclear double resonance (ENDOR) data. This feature is not observed in material doped with other group-III elements. Another open issue involves conflicting conclusions from photoluminescence and EPR studies of a deeper boron center, which has been linked to rather distinct models, either based on substitutional or vacancy-related boron defects. We unlock these and other problems by means of first-principles calculations, where the temperature-dependent stability, the electronic activity, and the paramagnetic response of boron defects in 4H-SiC are investigated.
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