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arXiv 2403.09013cond-mat.mtrl-sci
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点缺陷对立方硼砷化物浅掺杂的影响:一种第一性原理研究

Impacts of Point Defects on Shallow Doping in Cubic Boron Arsenide: A First Principles Study

Idaho National Laboratory(爱达荷国家实验室);Department of Mechanical Engineering, University of Utah(犹他大学机械工程系)

Shuxiang Zhou, Zilong Hua, Kaustubh K. Bawane, Hao Zhou, Tianli Feng

AI总结:

研究通过第一性原理方法分析点缺陷对立方硼砷化物p型和n型掺杂的影响,发现特定缺陷对掺杂有促进或抑制作用,为BAs基电子器件发展提供理论依据。

摘要:

立方硼砷化物(BAs)因其优异的热导率和双极迁移率成为先进电子器件的有潜力材料。然而,有效控制BAs的p型和n型掺杂面临挑战,主要源于缺陷的影响。本研究利用密度泛函理论(DFT)探讨了C、O和Si等常见点缺陷和杂质对Be_B和Si_As的p型掺杂,以及Si_B和Se_As的n型掺杂的影响。发现最有利的点缺陷包括C_As、O_BO_As、Si_As、C_AsSi_B和O_BS_As,其形成能低于1.5 eV。虽然O杂质对n型和p型掺杂都有害,但C和Si杂质对n型掺杂有害。有趣的是,反位缺陷对As_BB_As对p型和n型掺杂都有益。本研究的掺杂限制分析可能为BAs基电子器件的发展提供战略方向。

英文摘要:

Cubic boron arsenide (BAs) stands out as a promising material for advanced electronics, thanks to its exceptional thermal conductivity and ambipolar mobility. However, effective control of p- and n-type doping in BAs poses a significant challenge, mostly as a result of the influence of defects. In the present study, we employed density functional theory (DFT) to explore the impacts of the common point defects and impurities on p-type doping of Be$_\text{B}$ and Si$_\text{As}$, and on n-type doping of Si$_\text{B}$ and Se$_\text{As}$. We found that the most favorable point defects formed by C, O, and Si are C$_\text{As}$, O$_\text{B}$O$_\text{As}$, Si$_\text{As}$, C$_\text{As}$Si$_\text{B}$, and O$_\text{B}$Si$_\text{As}$, which have formation energies of less than $1.5$ eV. While the O impurity detrimentally affects both n- and p-type dopings, C and Si impurities are harmful for n-type dopings. Interestingly, the antisite defect pair As$_\text{B}$B$_\text{As}$ benefits both p- and n-type doping. The doping limitation analysis presented in this study can potentially pave the way for strategic development in the area of BAs-based electronics.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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