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arXiv 2203.00985cond-mat.mtrl-sci
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SiC上的氮化硼(0001)

Boron nitride on SiC(0001)

You-Ron Lin, Markus Franke, Shayan Parhizkar, Miriam Raths, Victor Wen-zhe Yu, Tien-Lin Lee, Serguei Soubatch, Volker Blum, F. Stefan Tautz, Christian Kumpf, François C. Bocquet

摘要:

在范德华异质结构领域中,堆叠的二维(2D)层之间的扭转角已经被确定为对于异质结构的性质至关重要。在这种情况下,我们先前报道了在表面活性剂气氛中形成的单层非常规取向的外延石墨烯的生长[F. C. Bocquet等人,物理修订信函125,106102(2020)]。由此产生的G-R 0 $^\circ$层与SiC晶格对齐,因此代表了迈向高质量扭曲双层石墨烯(tBLG)的重要里程碑,tBLG是该领域经常研究的模型系统。在这里,我们专注于在相同的表面活性剂气氛中获得的表面结构,但在较低的制备温度下,氮化硼模板层在SiC(0001)上形成。在一项基于互补实验和理论技术的综合研究中,我们发现-与文献相反-该模板层是六方B $_x$ N $_y$层,但不是高质量的hBN。它与SiC晶格对齐,并在退火时逐渐被B $_x$ N $_y$模板层的0 $^\circ$取向的低质量石墨烯取代。

英文摘要:

In the field of van der Waals heterostructures, the twist angle between stacked two-dimensional (2D) layers has been identified to be of utmost importance for the properties of the heterostructures. In this context, we previously reported the growth of a single layer of unconventionally oriented epitaxial graphene that forms in a surfactant atmosphere [F. C. Bocquet, et al., Phys. Rev. Lett. 125, 106102 (2020)]. The resulting G-R0$^\circ$ layer is aligned with the SiC lattice, and hence represents an important milestone towards high quality twisted bilayer graphene (tBLG), a frequently investigated model system in this field. Here, we focus on the surface structures obtained in the same surfactant atmosphere, but at lower preparation temperatures at which a boron nitride template layer forms on SiC(0001). In a comprehensive study based on complementary experimental and theoretical techniques, we find -- in contrast to the literature -- that this template layer is a hexagonal B$_x$N$_y$ layer, but not high-quality hBN. It is aligned with the SiC lattice and gradually replaced by low-quality graphene in the 0$^\circ$ orientation of the B$_x$N$_y$ template layer upon annealing.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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