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arXiv 2212.09331cond-mat.mes-hallcond-mat.mtrl-sci

Dirac费米子方法及其在磁性拓扑绝缘体多层膜中设计高陈数的应用

A Dirac-fermion approach and its application to design high Chern numbers in magnetic topological insulator multilayers

Dinghui Wang, Huaiqiang Wang, Haijun Zhang

AI总结:

本文提出一种Dirac-fermion方法,用于理解和设计层状磁性拓扑绝缘体多层膜中的高陈数,并成功解释了MnBi$_{2}$Te$_{4}$薄膜和特定多层膜中的高陈数及拓扑相变,为设计高陈数QAH态提供了有力工具。

摘要:

量子反常霍尔(QAH)绝缘体承载着拓扑保护的无耗散手性边缘态,其数量由其陈数决定。迄今为止,QAH态已在少数磁性拓扑绝缘体中实现,但通常陈数较低。在此,我们开发了一种Dirac-fermion方法,该方法对于理解和设计各种层状磁性拓扑绝缘体多层膜中的高陈数具有重要价值。基于该Dirac-fermion方法,我们展示了如何通过范德华(vdW)间隙调制来理解和调控铁磁MnBi$_{2}$Te$_{4}$薄膜中的高陈数。此外,我们还利用Dirac-fermion方法理解了实验中观察到的高陈数,以及[3QL-(Bi,Sb)$_{1.76}$Cr$_{0.24}$Te$_{3}$]/[4QL-(Bi,Sb)$_{2}$Te$_{3}$]多层膜中从陈数$C=2$到$C=1$的拓扑相变。我们的工作为在层状磁性拓扑绝缘体多层膜中设计具有高陈数的QAH态提供了强有力的工具。

英文摘要:

Quantum anomalous Hall (QAH) insulators host topologically protected dissipationless chiral edge states, the number of which is determined by its Chern number. Up to now, the QAH state has been realized in a few magnetic topological insulators, but usually with a low Chern number. Here, we develop a Dirac-fermion approach which is valuable to understand and design high Chern numbers in various multilayers of layered magnetic topological insulators. Based on the Dirac-fermion approach, we demonstrate how to understand and tune high Chern numbers in ferromagentic MnBi$_{2}$Te$_{4}$ films through the van der Waals (vdW) gap modulation. Further, we also employ the Dirac-fermion approach to understand the experimentally observed high Chern numbers and topological phase transition from the Chern number $C=2$ to $C=1$ in the [3QL-(Bi,Sb)$_{1.76}$Cr$_{0.24}$Te$_{3}$]/[4QL-(Bi,Sb)$_{2}$Te$_{3}$] multilayers. Our work provides a powerful tool to design the QAH states with a high Chern number in layered magnetic topological insulator multilayers.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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