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arXiv 2208.08044cond-mat.mes-hall
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Al/SiO$_2$/Si 结宽范围有效功函数调节通过在 Al/SiO$_2$ 界面插入石墨烯夹层实现

Wide Effective Work-Function Tuning of Al/SiO$_2$/Si Junction Achieved with Graphene Interlayer at Al/SiO$_2$ Interface

Wonho Song, Jung-Yong Lee, Junhyung Kim, Jinyoung Park, Jaehyeong Jo, Eunseok Hyun, Jiwan Kim, Daejin Eom, Gahyun Choi, Kibog Park

AI总结:

本文通过在 Al/SiO$_2$/n-Si 结界面插入石墨烯夹层,使 Al 电极有效功函数显著增加约 1.04 eV,并基于 Poisson 方程分析证实其源于电子轨道重叠形成的电偶极层,为构建双金属栅 CMOS 电路提供了新途径。

摘要:

金属电极的有效功函数是决定金属/氧化物/半导体结阈值电压的主要因素之一。本研究通过实验证明,在 Al/SiO$_2$/n-Si 结的 Al/SiO$_2$ 界面插入石墨烯夹层后,Al 电极的有效功函数显著增加约 1.04 eV。我们还提供了在结上施加平带电压时求解 Poisson 方程的器件物理分析,支持了 Al 有效功函数的宽范围调节源于 Al 与石墨烯层之间电子轨道重叠形成的电偶极层。本研究表明,仅通过使用带有特定区域底层石墨烯夹层的 Al 电极,即可构建双金属栅 CMOS 电路。

英文摘要:

The effective work-function of metal electrode is one of the major factors to determine the threshold voltage of metal/oxide/semiconductor junction. In this work, we demonstrate experimentally that the effective work-function of Aluminum (Al) electrode in Al/SiO$_2$/n-Si junction increases significantly by $\sim$1.04 eV with the graphene interlayer inserted at Al/SiO$_2$ interface. We also provide the device-physical analysis of solving Poisson equation when the flat-band voltage is applied to the junction, supporting that the wide tuning of Al effective work-function originates from the electrical dipole layer formed by the overlap of electron orbitals between Al and graphene layer. Our work suggests the feasibility of constructing the dual-metal gate CMOS circuitry just by using Al electrodes with area-specific underlying graphene interlayer.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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