Qubit-compatible substrates with superconducting through-silicon vias
K. Grigoras, N. Yurttagül, J. -P. Kaikkonen, E. T. Mannila, P. Eskelinen, D. P. Lozano, H. -X. Li, M. Rommel, D. Shiri, N. Tiencken, S. Simbierowicz, A. Ronzani… 展开作者
K. Grigoras, N. Yurttagül, J. -P. Kaikkonen, E. T. Mannila, P. Eskelinen, D. P. Lozano, H. -X. Li, M. Rommel, D. Shiri, N. Tiencken, S. Simbierowicz, A. Ronzani, J. Hätinen, D. Datta, V. Vesterinen, L. Grönberg, J. Biznárová, A. Fadavi Roudsari, S. Kosen, A. Osman, M. Prunnila, J. Hassel, J. Bylander, J. Govenius
备注:
Accepted version. 11 pages, 7 figures, 2 tables with appendices included
发表信息:
IEEE Transactions on Quantum Engineering, vol. 3, pp. 1-10, 2022, Art no. 5100310
We fabricate and characterize superconducting through-silicon vias and electrodes suitable for superconducting quantum processors. We measure internal quality factors of a million for test resonators excited at single-photon levels, on chips with superconducting vias used to stitch ground planes on the front and back sides of the chips. This resonator performance is on par with the state of the art for silicon-based planar solutions, despite the presence of vias. Via stitching of ground planes is an important enabling technology for increasing the physical size of quantum processor chips, and is a first step toward more complex quantum devices with three-dimensional integration.
Characterization of process-related interfacial dielectric loss in aluminum-on-silicon by resonator microwave measurements, materials analysis, and imaging
The Casimir free energy of peptide films on a silicon substrate: Impact of dielectric-to-metal transition in silicon and nanoparticles in peptide
Central Astronomical Observatory at Pulkovo of the Russian Academy of Sciences(俄罗斯科学院普尔科沃中央天文台);Peter the Great Saint Petersburg Polytechnic University(彼得大帝圣彼得堡理工大学)
Opto-Electrical Detection of Donor Bound Excitons in Silicon-on-Insulator Substrate
University of Jyväskylä(于韦斯屈莱大学);QuTech(奎泰克);Netherlands Organisation for Applied Scientific Research (TNO)(荷兰应用科学研究组织);Kavli Institute of Nanoscience, Delft University of Technology(代尔夫特理工大学卡弗里纳米科学研究所)