arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2012.11289cond-mat.mtrl-sci
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量子阱薄膜中Rashba型自旋分裂的标度律

Scaling law for the Rashba-type spin splitting in quantum well films

Ryo Noguchi, Kenta Kuroda, Mitsuaki Kawamura, Koichiro Yaji, Ayumi Harasawa, Takushi Iimori, Shik Shin, Fumio Komori, Taisuke Ozaki, Takeshi Kondo

摘要:

利用高分辨率的激光自旋和角度分辨光电子能谱(laser-SARPES),通过对Au(111)衬底上生长的Ag薄膜的观察,首次从实验上测量了量子阱态的Rashba参数随薄膜厚度和量子数的系统变化。用基于密度泛函理论的理论计算很好地再现了数据。最重要的是,我们发现了一个Rashba参数($α_{\rm R}$)的标度律,即$α_{\rm R}$的大小由界面电荷密度和薄膜与衬底之间的自旋轨道耦合比标度,并且它由一条直线表示,与薄膜厚度和量子数无关。这一新发现不仅对理解量子阱中的Rashba效应至关重要,而且为薄膜生长工程提供了基础,以微调二维异质结构系统中的自旋分裂。

英文摘要:

We use laser-based spin- and angle-resolved photoemission spectroscopy (laser-SARPES) with high-resolution, and experimentally determine, for the first time, the Rashba-parameters of quantum well states (QWSs) systematically changing with the film thickness and the quantum numbers, through the observation of the Ag films grown on an Au(111) substrate. The data are very well reproduced by the theoretical calculations based on the density functional theory. Most importantly, we find a scaling law for the Rashba parameter ($α_{\rm R}$) that the magnitude of $α_{\rm R}$ is scaled by the charge density at the interface and the spin-orbit coupling ratio between the film and the substrate, and it is expressed by a single straight line regardless of the film thickness and the quantum numbers. The new finding not only is crucial to understand the Rashba effect in QWSs but also gives a foundation of film growth engineering to fine-tune the spin splitting in 2D heterostructure systems.

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