arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2011.15061physics.app-ph
收藏

Laser Processing For 3D Junctionless Transistor Fabrication

D. Bosch, P. Acosta Alba, S. Kerdiles, V. Benevent, C. Perrot, J. Lassarre, J. Richy, J. Lacord, B. Sklenard, L. Brunet, P. Batude, C. Fenouillet-Beranger, D. L… 展开作者

D. Bosch, P. Acosta Alba, S. Kerdiles, V. Benevent, C. Perrot, J. Lassarre, J. Richy, J. Lacord, B. Sklenard, L. Brunet, P. Batude, C. Fenouillet-Beranger, D. Lattard, J. P. Colinge, F. Balestra, F. Andrieu

英文摘要:

To take fully advantage of Junctionless transistor (JLT) low-cost and low-temperature features we investigate a 475 degC process to create onto a wafer a thin poly-Si layer on insulator. We fabricated a 13nm doped (Phosphorous, 1E19 at/cm3) poly-silicon film featuring excellent roughness values (Rmax= 1.6nm and RMS=0.2nm). Guidelines for grain size optimization using nanosecond (ns) laser annealing are given.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑