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arXiv 2002.11972cond-mat.mtrl-sci
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点缺陷中零声子线的理论极化

Theoretical polarization of zero phonon lines in point defects

Joel Davidsson

摘要:

在量子技术中,半导体中的点缺陷变得越来越重要。了解零声子线的频率、强度和偏振是很重要的。最后两个属性是本文的主题。我提出了一种方法来计算这些属性,并显示使用波函数从地面和激发态的重要性。通过对4 H-SiC中双空位的分析,验证了该方法的有效性。在这里,计算出的极化和寿命与实验测量非常吻合。一般来说,这种方法可以帮助识别点缺陷并估计合适的应用。

英文摘要:

In quantum technologies, point defects in semiconductors are becoming more significant. Understanding the frequency, intensity, and polarization of the zero phonon line is important. The last two properties are the subject of this paper. I present a method for calculating these properties and show the importance of using wave functions from both the ground and excited state. The validity of this method is demonstrated on the divacancy in 4H-SiC. Here, the calculated polarization and lifetimes are in excellent agreement with experimental measurements. In general, this method can help to identify point defects and estimate suitable applications.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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