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arXiv 2002.01574cond-mat.mes-hallcond-mat.mtrl-sci
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MoS $_2$原子层单缺陷忆阻器

Single-defect Memristor in MoS$_2$ Atomic-layer

Saban M. Hus, Ruijing Ge, Po-An Chen, Meng-Hsueh Chiang, Gavin E. Donnelly, Wonhee Ko, Fumin Huang, Liangbo Liang, An-Ping Li, Deji Akinwande

摘要:

非易失性电阻开关,也称为双端器件中的忆阻器效应,已经成为高密度信息存储、脑启发计算和可重构系统的持续发展中最重要的组成部分之一。最近,在过渡金属二硫属化物三明治结构的原子单层中意外发现忆阻器效应,由于尺寸缩放的前景和相关益处,增加了新的感兴趣的维度。然而,原子片中开关机制的起源仍然不确定。在这里,使用单层MoS $_2$作为模型系统,原子成像和光谱显示,金属取代到硫空位导致电阻的非挥发性变化。实验观察证实了缺陷结构和电子状态的计算研究。这些非凡的发现提供了对非易失性开关机制的原子理解,并为精确缺陷工程开辟了新的方向,甚至是单个缺陷,以实现最佳性能指标,包括使用原子纳米材料的存储器密度,开关能量,速度和可靠性。

英文摘要:

Non-volatile resistive switching, also known as memristor effect in two terminal devices, has emerged as one of the most important components in the ongoing development of high-density information storage, brain-inspired computing, and reconfigurable systems. Recently, the unexpected discovery of memristor effect in atomic monolayers of transitional metal dichalcogenide sandwich structures has added a new dimension of interest owing to the prospects of size scaling and the associated benefits. However, the origin of the switching mechanism in atomic sheets remains uncertain. Here, using monolayer MoS$_2$ as a model system, atomistic imaging and spectroscopy reveal that metal substitution into sulfur vacancy results in a non-volatile change in resistance. The experimental observations are corroborated by computational studies of defect structures and electronic states. These remarkable findings provide an atomistic understanding on the non-volatile switching mechanism and open a new direction in precision defect engineering, down to a single defect, for achieving optimum performance metrics including memory density, switching energy, speed, and reliability using atomic nanomaterials.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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