arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2001.10225cond-mat.mes-hall
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硅电子器件内部的扫描单电子探针

Scanned single-electron probe inside a silicon electronic device

Kevin S. H. Ng, Benoit Voisin, Brett C. Johnson, Jeffrey C. McCallum, Joe Salfi, Sven Rogge

摘要:

固态器件可以在原子尺度上制造,应用范围从经典逻辑到当前标准和量子技术。虽然非常希望在原子尺度上探测这些器件和它们所具有的量子态,但是典型的方法依赖于长程电容相互作用,这使得探测变得困难。在这里,我们探测硅电子器件在原子尺度上使用一个本地化的电子量子点直接在设备内所需的位置诱导,使用偏置的低温扫描隧道显微镜的尖端。我们展示了使用亚纳米位置控制的尖端,和量子点能级使用施加到设备的栅极水库的电压的量子点与设备的源水库的短程隧道耦合相互作用的控制。尽管量子点与金属尖端的接近度为$\sim 1$ nm,但我们发现栅极提供了足够的电容以实现高度的电控制。结合原子尺度成像,我们使用量子点探测器件中单个缺陷中的外加电场和电荷。这种能力有望有助于理解原子尺度的器件和其中实现的量子态。

英文摘要:

Solid-state devices can be fabricated at the atomic scale, with applications ranging from classical logic to current standards and quantum technologies. While it is very desirable to probe these devices and the quantum states they host at the atomic scale, typical methods rely on long-ranged capacitive interactions, making this difficult. Here we probe a silicon electronic device at the atomic scale using a localized electronic quantum dot induced directly within the device at a desired location, using the biased tip of a low-temperature scanning tunneling microscope. We demonstrate control over short-ranged tunnel coupling interactions of the quantum dot with the device's source reservoir using sub-nm position control of the tip, and the quantum dot energy level using a voltage applied to the device's gate reservoir. Despite the $\sim 1$nm proximity of the quantum dot to the metallic tip, we find the gate provides sufficient capacitance to enable a high degree of electric control. Combined with atomic scale imaging, we use the quantum dot to probe applied electric fields and charge in individual defects in the device. This capability is expected to aid in the understanding of atomic-scale devices and the quantum states realized in them.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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