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arXiv 1907.07579cond-mat.str-el
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SrRuO $_3$薄膜中的Berry相位操纵

Berry phase manipulation in ultrathin SrRuO$_3$ films

Liang Wu, Fangdi Wen, Yixing Fu, Justin H. Wilson, Xiaoran Liu, Yujun Zhang, Denis M. Vasiukov, Mikhail S. Kareev, J. H. Pixley, Jak Chakhalian

摘要:

Berry相的概念是一种强有力的手段来揭示拓扑结构在手性磁性材料和结构中观察到的各种新现象中的重要作用。一个著名的例子是由动量空间中的非零Berry相驱动的本征反常霍尔效应(AHE)。由于AHE高度依赖于费米边缘附近的能带结构的细节,Berry相和AHE可以在薄膜中改变,其化学势可以通过维度和无序来调节。在这里,我们表明,在SrRuO $_3$薄膜的Berry相可以有效地操纵的影响,无序的内在Berry相的贡献AHE,这是证实了我们的数值精确计算。此外,我们的研究结果提供了充分的实验证据的拓扑霍尔效应归因于受保护的自旋织构的表面性质,而不是借给强有力的支持,多通道AHE方案在SrSrRuO $_3$。

英文摘要:

A notion of the Berry phase is a powerful means to unravel the non-trivial role of topology in various novel phenomena observed in chiral magnetic materials and structures. A celebrated example is the intrinsic anomalous Hall effect (AHE) driven by the non-vanishing Berry phase in the momentum space. As the AHE is highly dependent on details of the band structure near the Fermi edge, the Berry phase and AHE can be altered in thin films whose chemical potential is tunable by dimensionality and disorder. Here, we demonstrate that in ultrathin SrRuO$_3$ films the Berry phase can be effectively manipulated by the effects of disorder on the intrinsic Berry phase contribution to the AHE, which is corroborated by our numerically exact calculations. In addition, our findings provide ample experimental evidence for the superficial nature of the topological Hall effect attribution to the protected spin texture and instead lend strong support to the multi-channel AHE scenario in ultrathin SrRuO$_3$.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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