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arXiv 1904.03055physics.app-ph
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硅基III族氮化物光子晶体腔在短波长(约300 nm)下的Q因子限制

Q factor limitation at short wavelength (around 300 nm) in III-nitride-on-silicon photonic crystal cavities

Farsane Tabataba-Vakili, Iannis Roland, Thi-Mo Tran, Xavier Checoury, Moustafa El Kurdi, Sébastien Sauvage, Christelle Brimont, Thierry Guillet, Stéphanie Renne… 展开作者

Farsane Tabataba-Vakili, Iannis Roland, Thi-Mo Tran, Xavier Checoury, Moustafa El Kurdi, Sébastien Sauvage, Christelle Brimont, Thierry Guillet, Stéphanie Rennesson, Jean-Yves Duboz, Fabrice Semond, Bruno Gayral, Philippe Boucaud

摘要:

已经证明了硅上III族氮化物L3光子晶体腔,其谐振波长低至315 nm,在337 nm处的品质因数(Q)高达1085。研究了品质因数随波长的减小而减小的规律。除了低于340 nm的量子阱吸收,一个值得注意的贡献是由于在硅上生长的薄AlN层中存在的残留吸收,通过光谱椭圆偏振法测量。当不存在有源层时,这种残余吸收最终将Q因子限制在300 nm处的2000左右。

英文摘要:

III-nitride-on-silicon L3 photonic crystal cavities with resonances down to 315 nm and quality factors (Q) up to 1085 at 337 nm have been demonstrated. The reduction of the quality factor with decreasing wavelength is investigated. Besides the quantum well absorption below 340 nm, a noteworthy contribution is attributed to the residual absorption present in thin AlN layers grown on silicon, as measured by spectroscopic ellipsometry. This residual absorption ultimately limits the Q factor to around 2000 at 300 nm when no active layer is present.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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