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arXiv 1808.02119cond-mat.mes-hall
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Asymmetric Schottky Contacts in Bilayer MoS2 Field Effect Transistors

Antonio Di Bartolomeo, Alessandro Grillo, Francesca Urban, Laura Iemmo, Filippo Giubileo, Giuseppe Luongo, Giampiero Amato, Luca Croin, Linfeng Sun, Shi-Jun Liang, Lay Kee Ang

英文摘要:

We discuss the high-bias electrical characteristics of back-gated field-effect transistors with CVD-synthesized bilayer MoS2 channel and Ti Schottky contacts. We find that oxidized Ti contacts on MoS2 form rectifying junctions with ~0.3 to 0.5 eV Schottky barrier height. To explain the rectifying output characteristics of the transistors, we propose a model based on two slightly asymmetric back-to-back Schottky barriers, where the highest current arises from image force barrier lowering at the electrically forced junction, while the reverse current is due to Schottky-barrier limited injection at the grounded junction. The device achieves a photo responsivity greater than 2.5 AW-1 under 5 mWcm-2 white-LED light. By comparing two- and four-probe measurements, we demonstrate that the hysteresis and persistent photoconductivity exhibited by the transistor are peculiarities of the MoS2 channel rather than effects of the Ti/MoS2 interface.

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