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arXiv 1806.00501cond-mat.mtrl-sci
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距离对graphene-WSe2异质结构光致发光猝灭和邻近诱导自旋轨道耦合的影响

Effect of distance on photoluminescence quenching and proximity-induced spin-orbit coupling in graphene-WSe2 heterostructures

Bowen Yang, Everardo Molina, Jeongwoo Kim, David Barroso, Mark Lohmann, Yawen Liu, Yadong Xu, Ruqian Wu, Ludwig Bartels, Kenji Watanabe, Takashi Taniguchi, Jing Shi

摘要:

石墨烯中的自旋轨道耦合(SOC)可以通过将其邻近耦合到过渡金属二硫属化物(TMD)如WSe 2来大大增强。我们发现,当使用六方氮化硼(h-BN)作为覆盖层时,石墨烯中获得的SOC的强度取决于异质结构的堆叠顺序,即,SiO2/石墨烯/WSe 2/h-BN表现出比SiO2/WSe 2/石墨烯/h-BN更强的SOC。我们利用光致发光(PL)作为一个指标来表征石墨烯和单层WSe 2生长的化学气相沉积之间的相互作用。我们观察到SiO2/graphene/WSe 2/h-BN堆叠中的PL猝灭比SiO2/WSe 2/graphene/h-BN堆叠中的PL猝灭强得多,并且相应地,前者中的弱反局域化(WAL)效应或诱导SOC比后者中的更强。我们将这两种效应归因于石墨烯和WSe 2之间的层间距离,这取决于石墨烯是否与h-BN直接接触。我们的观察和假设进一步得到了第一性原理计算的支持,该计算揭示了这两种堆叠中石墨烯和WSe 2之间的层间距离的明显差异。

英文摘要:

Spin-orbit coupling (SOC) in graphene can be greatly enhanced by proximity coupling it to transition metal dichalcogenides (TMDs) such as WSe2. We find that the strength of the acquired SOC in graphene depends on the stacking order of the heterostructures when using hexagonal boron nitride (h-BN) as the capping layer, i.e., SiO2/graphene/WSe2/h-BN exhibiting stronger SOC than SiO2/WSe2/graphene/h-BN. We utilize photoluminescence (PL) as an indicator to characterize the interaction between graphene and monolayer WSe2 grown by chemical vapor deposition. We observe much stronger PL quenching in the SiO2/graphene/WSe2/h-BN stack than in the SiO2/WSe2/graphene/h-BN stack, and correspondingly a much larger weak antilocalization (WAL) effect or stronger induced SOC in the former than in the latter. We attribute these two effects to the interlayer distance between graphene and WSe2, which depends on whether graphene is in immediate contact with h-BN. Our observations and hypothesis are further supported by first-principles calculations which reveal a clear difference in the interlayer distance between graphene and WSe2 in these two stacks.

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