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arXiv 1702.01515cond-mat.mtrl-sci
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SrRuO3/BaTiO3/SrRuO3电容器铁电性的界面控制及其临界厚度

Interface control of ferroelectricity in a SrRuO3/BaTiO3/SrRuO3 capacitor and its critical thickness

Yeong Jae Shin, Yoonkoo Kim, Sung-Jin Kang, Ho-Hyun Nahm, Pattukkannu Murugavel, Jeong Rae Kim, Myung Rae Cho, Lingfei Wang, Sang Mo Yang, Jong-Gul Yoon, Jin-Se… 展开作者

Yeong Jae Shin, Yoonkoo Kim, Sung-Jin Kang, Ho-Hyun Nahm, Pattukkannu Murugavel, Jeong Rae Kim, Myung Rae Cho, Lingfei Wang, Sang Mo Yang, Jong-Gul Yoon, Jin-Seok Chung, Miyoung Kim, Hua Zhou, Seo Hyoung Chang, Tae Won Noh

摘要:

人工氧化物异质结构的原子级合成为创造自然界中不存在的新状态提供了新的机会。与合成这些结构相关的主要挑战是获得具有设计的终止序列的原子尖锐界面。在这里,我们表明,在生长过程中的氧气压力(PO 2)在控制SrRuO 3/BaTiO 3/SrRuO 3(SRO/BTO/SRO)铁电电容器的界面终端起着重要的作用。SRO/BTO/SRO异质结采用脉冲激光沉积(PLD)方法生长。在高PO 2(约150 mTorr)下生长的顶部SRO/BTO界面通常表现出RuO 2-BaO和SrO-TiO 2终端的混合物。通过还原PO 2,我们获得了原子级尖锐的SRO/BTO顶部界面与均匀的SrO-TiO 2终止。使用具有对称和均匀界面终止的电容器器件,我们能够首次证明铁电体(FE)的临界厚度可以达到3.5个晶胞(u.c.)的理论极限。

英文摘要:

The atomic-scale synthesis of artificial oxide heterostructures offers new opportunities to create novel states that do not occur in nature. The main challenge related to synthesizing these structures is obtaining atomically sharp interfaces with designed termination sequences. Here, we demonstrate that the oxygen pressure (PO2) during growth plays an important role in controlling the interfacial terminations of SrRuO3/BaTiO3/SrRuO3 (SRO/BTO/SRO) ferroelectric capacitors. The SRO/BTO/SRO heterostructures were grown by the pulsed laser deposition (PLD) method. The top SRO/BTO interface grown at high PO2 (around 150 mTorr) usually exhibited a mixture of RuO2-BaO and SrO-TiO2 terminations. By reducing PO2, we obtained atomically sharp SRO/BTO top interfaces with uniform SrO-TiO2 termination. Using capacitor devices with symmetric and uniform interfacial termination, we were able to demonstrate for the first time that the ferroelectric (FE) critical thickness can reach the theoretical limit of 3.5 unit cells (u.c.).

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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