arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2501.06754cond-mat.mtrl-sciphysics.app-ph
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通过界面设计实现Hf0.5Zr0.5O2超薄膜的无疲劳铁电性

Fatigue-free ferroelectricity in Hf0.5Zr0.5O2 ultrathin films via interfacial design

Chao Zhou, Yanpeng Feng, Liyang Ma, Haoliang Huang, Yangyang Si, Hailin Wang, Sizhe Huang, Jingxuan Li, Chang-Yang Kuo, Sujit Das, Yunlong Tang, Shi Liu, Zuhuang Chen

AI总结:

针对HfO2基铁电材料的疲劳可靠性难题,通过构建CeO2-x氧海绵异质界面和对称电容器结构的双策略,实现了超10^11次无疲劳开关与超10^12次耐久寿命,为超稳定铪基铁电器件研发奠定基础。

摘要:

基于HfO2的铁电材料因具备CMOS兼容性与可缩放性,是下一代存储器件的理想候选材料,但其商业化进程受可靠性问题严重阻碍,疲劳效应是主要障碍之一。本研究报道了经界面设计的Hf0.5Zr0.5O2基异质结构的无疲劳特性:构建了共格的CeO2-x/Hf0.5Zr0.5O2异质界面,其中CeO2-x充当“氧海绵”,可可逆地接收与释放氧空位,有效缓解电极-铁电界面的缺陷聚集,改善开关特性。此外,研究设计了对称电容器结构以最小化印记效应,抑制循环诱导的定向缺陷漂移。这种双管齐下的技术缓解了氧伏安法产生的化学/能量波动,抑制顺电相形成与极化退化。该设计使Hf0.5Zr0.5O2基电容器具备超过10^11次开关循环的无疲劳特性、超10^12次循环的耐久寿命,同时拥有优异的温度稳定性与保持性能,为开发超稳定铪基铁电器件铺平了道路。

英文摘要:

Due to traits of CMOS compatibility and scalability, HfO2-based ferroelectrics are promising candidates for next-generation memory devices. However, their commercialization has been greatly hindered by reliability issues, with fatigue being a major impediment. We report the fatigue-free behavior in interface-designed Hf0.5Zr0.5O2-based heterostructures. A coherent CeO2-x/Hf0.5Zr0.5O2 heterointerface is constructed, wherein CeO2-x acts as an oxygen sponge, capable of reversibly accepting and releasing oxygen vacancies. This design effectively alleviates defect aggregation at the electrode-ferroelectric interface, enabling improved switching characteristics. Further, a symmetric capacitor architecture is designed to minimize the imprint, thereby suppressing the cycling-induced oriented defect drift. The two-pronged technique mitigates oxygen-voltammetry-generated chemical/energy fluctuations, suppressing the formation of paraelectric phase and polarization degradation. The design ensures a fatigue-free feature exceeding 10^11 switching cycles and an endurance lifetime surpassing 10^12 cycles for Hf0.5Zr0.5O2-based capacitors, along with excellent temperature stability and retention. These findings pave the way for developing ultra-stable hafnia-based ferroelectric devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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