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arXiv 1609.09307cond-mat.mtrl-sci
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CVD生长MoS2的本征光学质量探讨

Probing the Intrinsic Optical Quality of CVD Grown MoS2

Amina Zafar, Haiyan Nan, Zainab Zafar, Zhangting Wu, Jie Jiang, Yumeng You, Zhenhua Ni

摘要:

二维层状过渡金属二硫属化合物(TMD)的发光效率是影响其光电性能的重要参数之一。因此,非常需要优化化学气相沉积(CVD)的生长参数以实现光电子级质量的TMD。在这里,我们提出了一个系统的光致发光(PL)光谱方法来评估的内在光学和晶体质量的CVD生长的二硫化钼。我们建议,在空气和真空中测量的PL之间的强度比可以作为一种有效的方法来监测CVD二硫化钼的本征光学质量。低温PL测量也被用来评估的缺陷相关的束缚激子发射,这是很好地与场效应载流子迁移率在不同温度下生长的二硫化钼在二硫化钼中的结构缺陷。因此,这项工作提供了一个敏感的,非侵入性的方法来表征的TMD的光学特性,允许调整生长参数的光电子器件的发展。

英文摘要:

The optical emission efficiency of two dimensional layered transition metal dichalcogenides (TMDs) is one of the most important parameter that affects their optoelectronic performance. Optimization of growth parameters of chemical vapor deposition (CVD) to achieve optoelectronics-grade quality TMDs is therefore highly desirable. Here, we present a systematic photoluminescence (PL) spectroscopic approach to assess the intrinsic optical and crystalline quality of CVD grown MoS2. We suggest that the intensity ratio between PL measured in air and vacuum could be used as an effective way to monitor the intrinsic optical quality of CVD MoS2. Low temperature PL measurements are also used to evaluate the structural defects in MoS2 by defect-associated bound exciton emission, which is well correlated with the field effect carrier mobilities of MoS2 grown at different temperatures. This work therefore provides a sensitive, noninvasive method to characterize the optical properties of TMDs, allow tuning of growth parameters for the development of optoelectronic devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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