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arXiv 1509.06643cond-mat.mtrl-sci
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氧化物界面的反位缺陷

Antisite defects at oxide interfaces

Hanghui Chen, Andrew J. Millis

摘要:

我们使用\textit{ab initio}计算来估计阳离子(过渡金属)反位缺陷在氧化物界面的形成能,并了解驱动或抑制这些缺陷的形成的基本物理效应。反位缺陷被发现是有利于在系统中大量的电荷转移的界面,而Jahn-Teller扭曲和巡回铁磁性可以防止反位缺陷,并有助于稳定原子尖锐的界面。我们的研究结果使系统的类别,可能是更多和更少的易受反位缺陷的形成,并激励实验研究和进一步的理论计算,以阐明局部结构和氧化物界面系统的稳定性的识别。

英文摘要:

We use \textit{ab initio} calculations to estimate formation energies of cation (transition metal) antisite defects at oxide interfaces and to understand the basic physical effects that drive or suppress the formation of these defects. Antisite defects are found to be favored in systems with substantial charge transfer across the interface, while Jahn-Teller distortions and itinerant ferromagnetism can prevent antisite defects and help stabilize atomically sharp interfaces. Our results enable identification of classes of systems that may be more and less susceptible to the formation of antisite defects and motivate experimental studies and further theoretical calculations to elucidate the local structure and stability of oxide interface systems.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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