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arXiv 1503.04398cond-mat.mes-hall
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亚10纳米区碳纳米管场效应晶体管的紧凑虚源模型--II外部元件、性能评估和设计优化

A Compact Virtual-Source Model for Carbon Nanotube Field-Effect Transistors in the Sub-10-nm Regime - Part II Extrinsic Elements, Performance Assessment, and Design Optimization

Chi-Shuen Lee, Eric Pop, Aaron D. Franklin, Wilfried Haensch, H. -S. Philip Wong

摘要:

我们提出了一个碳纳米管(CNT)场效应晶体管(CNFET)的数据校准的紧凑模型,包括接触电阻,直接源漏和带带隧穿电流。该模型捕获的尺寸缩放和性能退化的影响,由于寄生效应,并被用来研究CNFET的驱动电流和漏电流之间的权衡,根据CNT直径,CNT密度,接触长度,和栅极长度的目标接触栅极间距的选择。我们描述了一个共同的优化研究CNFET器件参数的缩放与物理洞察力的极限附近,并预计在5纳米技术节点的CNFET的性能与估计接触的栅极间距为31纳米。基于包括寄生电阻、电容和隧穿漏电流的分析,180 CNT/μm的CNT密度将使CNFET技术能够满足ITRS的驱动电流目标(1.33 mA/μm),这在现代实验能力范围内

英文摘要:

We present a data-calibrated compact model of carbon nanotube (CNT) field-effect transistors (CNFETs) including contact resistance, direct source-to-drain and band-to-band tunneling currents. The model captures the effects of dimensional scaling and performance degradations due to parasitic effects and is used to study the trade-offs between the drive current and leakage current of CNFETs according to the selection of CNT diameter, CNT density, contact length, and gate length for a target contacted gate pitch. We describe a co-optimization study of CNFET device parameters near the limits of scaling with physical insight, and project the CNFET performance at the 5-nm technology node with an estimated contacted gate pitch of 31 nm. Based on the analysis including parasitic resistance, capacitance, and tunneling leakage current, a CNT density of 180 CNTs/μm will enable CNFET technology to meet the ITRS target of drive current (1.33 mA/μm), which is within reach of modern experimental capabilities

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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