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arXiv 1503.01823cond-mat.mes-hallcond-mat.mtrl-sci
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MoS2薄膜晶体管中的低频1/f噪声:单层与多层结构的比较

Low-Frequency 1/f Noise in MoS2 Thin-Film Transistors: Comparison of Single and Multilayer Structures

S. L. Rumyantsev, C. Jiang, R. Samnakay, M. S. Shur, A. A. Balandin

AI总结:

本文比较了2-3层与15-18层MoS2薄膜晶体管的输运和1/f噪声特性,发现厚沟道器件迁移率更高、噪声更低且符合McWhorter模型,证明沟道厚度优化对实际应用至关重要。

摘要:

我们报告了具有“薄”(2-3个原子层)和“厚”(15-18个原子层)沟道的MoS2薄膜晶体管的输运和低频噪声测量结果。采用相对较厚MoS2沟道制成的背栅晶体管具有更高的电子迁移率和更低的噪声水平。“厚”MoS2晶体管中低频1/f噪声的归一化噪声谱密度与石墨烯中的噪声水平相当。具有原子级薄沟道的MoS2晶体管则表现出显著更高的噪声水平。研究证实,与石墨烯器件不同,具有“厚”沟道(15-18个原子平面)的MoS2晶体管的噪声特性可以用McWhorter模型描述。我们的结果表明,沟道厚度优化对于MoS2薄膜晶体管的实际应用至关重要。

英文摘要:

We report on the transport and low-frequency noise measurements of MoS2 thin-film transistors with "thin" (2-3 atomic layers) and "thick" (15-18 atomic layers) channels. The back-gated transistors made with the relatively thick MoS2 channels have advantages of the higher electron mobility and lower noise level. The normalized noise spectral density of the low-frequency 1/f noise in "thick" MoS2 transistors is of the same level as that in graphene. The MoS2 transistors with the atomically thin channels have substantially higher noise levels. It was established that, unlike in graphene devices, the noise characteristics of MoS2 transistors with "thick" channels (15-18 atomic planes) could be described by the McWhorter model. Our results indicate that the channel thickness optimization is crucial for practical applications of MoS2 thin-film transistors.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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