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arXiv 1502.05809cond-mat.mtrl-sci
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半谐AlN:交叉驱动的带隙跃迁

Hexagonal AlN: Dimensional-Crossover-Driven Bandgap Transition

C. Bacaksiz, H. Sahin, H. D. Ozaydin, S. Horzum, R. T. Senger, F. M. Peeters

摘要:

受最近报道六方(h)AlN的成功合成的实验的启发[Tsipas等人,Appl.Phys.Lett. 103,251605(2013)]我们通过使用第一性原理计算研究了h-AlN的体、双层和单层结构的结构、电子和振动性质。我们表明,六方相的散装h-AlN是一个稳定的直接带隙半导体。计算得到的声子谱在274 cm-1处有一个刚性层剪切模,在703 cm-1处有一个Eg模。此外,单层h-AlN是具有双基态的间接带隙半导体。对于双层结构,AA'型堆积是最有利的堆积方式,层间相互作用较强。虽然N-层状h-AlN是N=1-10的间接带隙半导体,但我们预测较厚的结构(N>10)在伽马点处具有直接带隙。在h-AlN中的层数依赖的带隙转变是有趣的,因为它是显着不同的间接到直接的过渡金属二硫属化物中获得的交叉。

英文摘要:

Motivated by a recent experiment that reported the successful synthesis of hexagonal (h) AlN [Tsipas et al. Appl. Phys. Lett. 103, 251605 (2013)] we investigate structural, electronic and vibrational properties of bulk, bilayer and monolayer structures of h-AlN by using first-principles calculations. We show that the hexagonal phase of the bulk h-AlN is a stable direct-bandgap semiconductor. Calculated phonon spectrum displays a rigid-layer shear mode at 274 cm-1 and an Eg mode at 703 cm-1 which are observable by Raman measurements. In addition, single layer h-AlN is an indirect-bandgap semiconductor with a nonmagnetic ground state. For the bilayer structure, AA' type stacking is found to be the most favorable one and interlayer interaction is strong. While N-layered h-AlN is an indirect bandgap semiconductor for N=1-10, we predict that thicker structures (N>10) have a direct-bandgap at the Gamma-point. The number-of-layer-dependent bandgap transitions in h-AlN is interesting in that it is significantly different from the indirect-to- direct crossover obtained in the transition metal dichalcogenides.

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