arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1301.2104cond-mat.mtrl-sci
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单层层状氮化硼薄膜的力学和应变可调带隙

Mechanics and Tunable Bandgap by Straining in Single-Layer Hexagonal Boron-Nitride

Jiangtao Wu, Baolin Wang, Yujie Wei, Ronggui Yang, Mildred Dresselhaus

摘要:

目前对二维材料的兴趣从石墨烯延伸到其他系统,如单层六方氮化硼(h-BN),的可能性,使异质结构,以实现特殊的性能,不能实现在石墨烯。电绝缘h-BN和半-金属石墨烯可以通过操纵这种异质结构的形态和组成来打开实现半导体的良好机会。用密度泛函理论计算了h-BN的力学性质和机械应变对h-BN能带结构的影响.结果表明,h-BN的弹性模量和弯曲刚度都是各向同性的,h-BN的禁带宽度与外加拉伸应变呈双线性关系.机械应变可以将单层h-BN从绝缘体调整为半导体,带隙在4.7eV至1.5eV范围内。

英文摘要:

Current interest in two-dimensional materials extends from graphene to others systems like single-layer hexagonal boron-nitride (h-BN), for the possibility of making heterogeneous structures to achieve exceptional properties that cannot be realized in graphene.The electrically insulating h-BN and semi-metal graphene may open good opportunities to realize a semiconductor by manipulating the morphology and composition of such heterogeneous structures.Here we report the mechanical properties of h-BN and its band structures tuned by mechanical straining by using the density functional theory calculations.The elastic properties, both the Young's modulus and bending rigidity for h-BN, are isotropic.We reveal that there is a bi-linear dependence of band gap on the applied tensile strains in h-BN. Mechanical strain can tune single-layer h-BN from an insulator to a semiconductor, with a band gap in the 4.7eV to 1.5eV range.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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