arXivDaily arXiv每日学术速递 周一至周五更新
北美退伍军人节(Veterans Day),12 日无更新
arXiv 1306.3406cond-mat.mtrl-sci
收藏

应变外延L10 Mn-Ga薄膜的各向异性损失

Loss of anisotropy in strained ultrathin epitaxial L10 Mn-Ga films

Albrecht Köhler, Ivan Knez, Daniel Ebke, Claudia Felser, Stuart S. P. Parkin

摘要:

在本工作中,我们研究了应变对室温下Mn-Ga薄膜磁性能的影响。在Cr缓冲MgO(001)衬底上生长了两种不同的Mn-Ga组分,其中一种还掺杂了Co。厚度低于12 nm的膜是高度应变的,并且观察到c/a与厚度的比率取决于组成。使用c/a作为序参量的PMA被证明是急剧减少,随着应变的增加。当推广和缩小从> 20 nm的薄膜获得的结果时,应考虑这些发现。此外,已经表明,可以通过引入额外的Pt缓冲层来降低应变,从而对于低至6 nm的厚度保持高PMA。

英文摘要:

In this work we are investigating the effect of strain in ultrathin Mn-Ga thin films on the magnetic properties at room temperature. Two different Mn-Ga compositions of which one is furthermore doped with Co were grown on Cr buffered MgO (001) substrates. Films with a thickness below 12nm are highly strained and it was observed that the ratio c/a vs. thickness is depending on composition. Using c/a as an order parameter the PMA is shown to be drastically reduced with increasing strain. These findings should be considered when generalizing and downscaling results obtained from films >20nm. Furthermore it has been shown, that the strain can be reduced by introducing an additional Pt buffer and thus maintaining a high PMA for a thickness as low as 6nm.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑