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arXiv 1206.4776cond-mat.mes-hall
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化学掺杂接触的高性能单层WSe2 p-FET

High Performance Single Layered WSe2 p-FETs with Chemically Doped Contacts

Hui Fang, Steven Chuang, Ting Chia Chang, Kuniharu Takei, Toshitake Takahashi, Ali Javey

摘要:

我们报道了基于单层(厚度约0.7 nm)WSe 2作为有源沟道的高性能p型场效应晶体管,其具有化学掺杂的源极/漏极接触和高κ栅极介电常数。顶栅单层晶体管在室温下表现出约250 cm 2/Vs的高有效空穴迁移率,约60 mV/dec的完美亚阈值摆幅,以及>10^6的ION/IOFF。特别注意的是,降低空穴注入的接触电阻,通过使用高功函数的Pd接触,以及退化的表面掺杂的接触图案化的NO2化学吸附WSe 2。这里的结果提出了一个有前途的材料系统和器件结构的p型单层晶体管具有优良的特性。

英文摘要:

We report high performance p-type field-effect transistors based on single layered (thickness, ~0.7 nm) WSe2 as the active channel with chemically doped source/drain contacts and high-κ gate dielectrics. The top-gated monolayer transistors exhibit a high effective hole mobility of ~250 cm2/Vs, perfect subthreshold swing of ~60 mV/dec, and ION/IOFF of >10^6 at room temperature. Special attention is given to lowering the contact resistance for hole injection by using high work function Pd contacts along with degenerate surface doping of the contacts by patterned NO2 chemisorption on WSe2. The results here present a promising material system and device architecture for p-type monolayer transistors with excellent characteristics.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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