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arXiv 2201.10278cond-mat.mes-hallcond-mat.mtrl-sci
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二维MoSi2N4:一种优良的二维晶体管半导体材料

Two-dimensional MoSi2N4: An Excellent 2D Semiconductor for Transistors

Keshari Nandan, Barun Ghosh, Amit Agarwal, Somnath Bhowmick, Yogesh S. Chauhan

摘要:

本文采用第一性原理量子输运模拟方法研究了由最近合成的单层二维MoSi_2N_4作为沟道材料的场效应晶体管(FET)的性能。这些器件的性能根据2034年的国际器件和系统路线图(IRDS)2020路线图进行评估,并与先进的硅基FET,碳纳米管基FET和其他有前途的二维材料基FET进行比较。最后,我们估计数字的组合和时序逻辑电路的优点,我们的双栅极器件和基准对有前途的替代逻辑技术的基础上。我们的设备和基于它们的电路的性能令人鼓舞,并且与其他逻辑替代品相比具有竞争力。

英文摘要:

We report the performance of field-effect transistors (FETs), comprised of mono-layer of recently synthesized layered two-dimensional MoSi2N_4 as channel material, using the first principles quantum transport simulations. The devices' performance is assessed as per the International Roadmap for Devices and Systems (IRDS) 2020 roadmap for the year 2034 and compared to advanced silicon-based FETs, carbon nanotube-based FETs, and other promising two-dimensional materials based FETs. Finally, we estimate the figure of merits of a combinational and a sequential logic circuit based on our double gate devices and benchmark against promising alternative logic technologies. The performance of our devices and circuits based on them are encouraging, and competitive to other logic alternatives.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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