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arXiv 1206.4183cond-mat.mtrl-sci
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拓扑绝缘体与正常绝缘体界面上退耦Dirac态的直接观测

Direct observation of decoupled Dirac states at the interface between topological and normal insulators

M. H. Berntsen, O. Götberg, B. M. Wojek, O. Tjernberg

摘要:

在拓扑绝缘体中的几种应用和奇异效应依赖于拓扑绝缘体和正常绝缘体之间界面处螺旋狄拉克态的存在。在本工作中,我们利用低能角分辨光电子能谱学对Si(111)衬底上生长的Bi $_2$ Se $_3$薄膜和Bi $_2$ Te $_3$ /Bi $_2$ Se $_3$异质结构的界面态进行了研究和表征。结果表明,狄拉克费米子确实存在于拓扑-正常-绝缘体边界,而不存在于拓扑-拓扑-绝缘体界面。此外,它表明,能带弯曲内存在的拓扑绝缘体膜导致的界面和表面态的能量的实质性分离。这些结果为进一步研究和实现拓扑绝缘体薄膜异质结构中的界面相关现象奠定了基础。

英文摘要:

Several proposed applications and exotic effects in topological insulators rely on the presence of helical Dirac states at the interface between a topological and a normal insulator. In the present work, we have used low-energy angle-resolved photoelectron spectroscopy to uncover and characterize the interface states of Bi$_2$Se$_3$ thin films and Bi$_2$Te$_3$/Bi$_2$Se$_3$ heterostuctures grown on Si(111). The results establish that Dirac fermions are indeed present at the topological-normal-insulator boundary and absent at the topological-topological-insulator interface. Moreover, it is demonstrated that band bending present within the topological-insulator films leads to a substantial separation of the interface and surface states in energy. These results pave the way for further studies and the realization of interface-related phenomena in topological-insulator thin-film heterostructures.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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