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arXiv 1202.0735cond-mat.mes-hall
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原子薄氮化硼:石墨烯器件的隧穿势垒

Atomically thin boron nitride: a tunnelling barrier for graphene devices

Liam Britnell, Roman V. Gorbachev, Rashid Jalil, Branson D. Belle, Fred Schedin, Mikhail I. Katsnelson, Laurence Eaves, Sergey V. Morozov, Alexander S. Mayorov,… 展开作者

Liam Britnell, Roman V. Gorbachev, Rashid Jalil, Branson D. Belle, Fred Schedin, Mikhail I. Katsnelson, Laurence Eaves, Sergey V. Morozov, Alexander S. Mayorov, Nuno M. R. Peres, Antonio H. Castro Neto, Jon Leist, Andre K. Geim, Leonid A. Ponomarenko, Kostya S. Novoselov

摘要:

我们研究的异质结构的电子特性的基础上的六方氮化硼(h-BN)晶体层夹在两层石墨烯以及其他导电材料(石墨,金)。隧道电导指数依赖于h-BN原子层的数量,下降到单层厚度。石墨烯/BN/石墨烯和石墨/BN/石墨器件的I-V特性的指数行为主要由电极中的态密度随偏压的变化来确定。不同厚度的h-BN平台的导电原子力显微镜扫描揭示了隧道电流的高水平的均匀性。我们的研究结果表明,原子级薄的h-BN作为一个无缺陷的电介质具有高击穿场,它提供了很大的应用潜力,在隧道器件和场效应晶体管中的导电沟道中的高载流子密度。

英文摘要:

We investigate the electronic properties of heterostructures based on ultrathin hexagonal boron nitride (h-BN) crystalline layers sandwiched between two layers of graphene as well as other conducting materials (graphite, gold). The tunnel conductance depends exponentially on the number of h-BN atomic layers, down to a monolayer thickness. Exponential behaviour of I-V characteristics for graphene/BN/graphene and graphite/BN/graphite devices is determined mainly by the changes in the density of states with bias voltage in the electrodes. Conductive atomic force microscopy scans across h-BN terraces of different thickness reveal a high level of uniformity in the tunnel current. Our results demonstrate that atomically thin h-BN acts as a defect-free dielectric with a high breakdown field; it offers great potential for applications in tunnel devices and in field-effect transistors with a high carrier density in the conducting channel.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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