最近对悬浮石墨烯层的实验表明，载流子迁移率在Laughlin集体态和绝缘态之间的竞争中起着至关重要的作用，可能是Wigner晶体类型。此外，在低载流子密度下观察到石墨烯中的分数量子霍尔效应（Fractional quantum Hall effect，FQHE），其中相互作用由于颗粒稀释而降低。这表明，相互作用可能不像基于复合费米子模型的标准公式所预期的那样重要。在这里，提出的拓扑参数来解释这些新的功能的石墨烯中，特别是载流子的迁移率的触发作用的的石墨烯中的石墨烯。
英文摘要：
Recent experiments on suspended graphene layers have indicated the crucial role of carrier mobility in the competition between Laughlin collective state and insulating state, probably of Wigner-crystal-type. Moreover, the fractional quantum Hall effect (FQHE) in graphene has been observed at a low carrier density where the interaction is reduced as a result of particles dilution. This suggests that the interaction may not be as important in the triggering of FQHE as expected based on the standard formulation of the composite fermions model. Here, the topological arguments are presented to explain these novel features of the FQHE in graphene and, the triggering role of carriers mobility in particular.
Semiconductors simultaneously possessing high carrier mobility, moderate bandgap, and ambient environment stability are so important for the modern industry, and Si-based semiconducting materials can match well with the previous silicon based electronic components. Thus, searching for such Si-based semiconductors has been one hot project due to the lack of them nowadays. Here, with the help of density functional theory, we found that the oxidized bilayer silicene exhibits high carrier mobility with a moderate direct bandgap of 1.02 eV. The high carrier mobility is caused by the remaining of bi…
Diamond field-effect transistors (FETs) have potential applications in power electronics and high-output high-frequency amplifications. In such applications, high charge-carrier mobility is desirable for a reduced loss and high-speed operation. We have recently fabricated diamond FETs with a hexagonal-boron-nitride gate dielectric and observed a high mobility above 300 cm$^{2}$V$^{-1}$s$^{-1}$. In this study, we examine which scattering mechanism limits the mobility of our FETs through theoretical calculations. Our calculations reveal that the dominant carrier scattering is caused by surface c…
Extraordinary high room-temperature carrier mobility in graphene-WSe$_2$ heterostructures
RWTH Aachen University（亚琛工业大学）；Forschungszentrum Jülich（于利希研究中心）；Université de Montpellier（蒙彼利埃大学）；CNRS（法国国家科学研究中心）；Vienna University of Technology（维也纳工业大学）；AMO GmbH（AMO有限公司）
High Intrinsic Mobility and Ultrafast Carrier Dynamics in Multilayer Metal Dichalcogenide MoS2
在金属二硫属化物中载流子迁移率的最终限制，以及与载流子弛豫相关的动力学，尚不清楚。我们提出了测量的多层dichalcogenide二硫化钼的频率依赖性的电导率的光泵太赫兹探测光谱。我们发现这种材料在低温下的迁移率接近4200 cm 2/Vs。散射的温度依赖性表明，迁移率，一个数量级大于以前报道的二硫化钼，是固有的限制在太赫兹频率的声学声子散射。我们的测量载流子弛豫揭示皮秒冷却时间，然后再复合持续数十纳秒，并占主导地位的俄歇散射到缺陷。我们的研究结果提供了一个有用的背景下，了解和评估的二硫化钼为基础的电子和光电子器件的性能。
Significant Enhancement of Carrier Mobility in Finite vs. Infinite Square Quantum Wells: A Comparative Study of GaAs/In$_x$Ga$_{1-x}$As/GaAs Heterostructures
Microscopic corrugations are ubiquitous in graphene even when placed on atomically flat substrates. These result in random local strain fluctuations limiting the carrier mobility of high quality hBN-supported graphene devices. We present transport measurements in hBN-encapsulated devices where such strain fluctuations can be in situ reduced by increasing the average uniaxial strain. When $\sim0.2\%$ of uniaxial strain is applied to the graphene, an enhancement of the carrier mobility by $\sim35\%$ is observed while the residual doping reduces by $\sim39\%$. We demonstrate a strong correlation …
Intrinsic carrier mobility of multi-layered MoS$_2$ field-effect transistors on SiO$_2$
通过制备和表征四端结构的多层MoS $_2$基场效应晶体管（FET），我们证明了由于接触处的肖特基势垒，两端结构倾向于低估载流子迁移率$μ$。对于背栅双端配置，我们观察到高达125 cm $^2$ V $^{-1}$ s $^{-1}$的迁移率，其显著小于当使用四端配置时从相同器件提取的306.5 cm $^2$ V $^{-1}$ s $^{-1}$。这表明在SiO $_2$上的MoS $_2$的本征迁移率明显大于先前报道的值，并提供了一种定量方法来评估通过接触的电荷传输。
Carrier Transport in High Mobility InAs Nanowire Junctionless Transistors
理解和模拟纳米线晶体管性能极限的能力是设计下一代器件的关键。在这里，我们报告的高迁移率结无栅全包围纳米线场效应晶体管的载流子迁移率在室温下达到2000 cm 2/V.s的研究。依赖于温度的运输测量揭示了激活运输在低温下由于表面捐助者，而在室温下的运输表现出扩散行为。从电导率数据中，提取的值的声速在InAs纳米线被发现是一个顺序小于散装。这种低声速归因于普遍出现在这些纳米线中的扩展的晶体缺陷。分析温度相关的迁移率数据，我们确定了关键的散射机制限制在这些纳米线的载流子传输。最后，使用这些散射模型，我们进行漂移扩散的纳米线场效应晶体管的输运模拟和比较与实验测量的设备性能。我们的器件建模提供了深入了解InAs纳米线晶体管的性能限制，并可用作基于MEMS的集成电路的预测方法。
Unveiling the Structural Origin of the High Carrier Mobility of a Molecular Monolayer on Boron Nitride
最近，它被证明，在氮化硼上的分子单层二辛基苯并噻吩并苯并噻吩（C8-BTBT）的载流子迁移率可以达到10 cm 2/Vs，在以前报道的单层分子场效应晶体管中最高。在这里，我们表明，高品质的单晶C8-BTBT单层可能是创纪录的高载流子迁移率的关键来源。我们发现C8-BTBT分子更喜欢在六方氮化硼和石墨烯上逐层生长。这些基底的平坦度显著降低了C8-BTBT成核密度，并且使得能够重复生长C8-BTBT单层的大面积单晶。我们的实验结果表明，只有面外粗糙度大于0.6 nm的衬底可以诱导在晶体生长的干扰，从而影响电荷输运。这些信息对指导高质量外延分子膜的生长具有重要意义。
Intrinsic Charge Carrier Mobility in Single-Layer Black Phosphorus
本文提出了一种适用于单层黑磷（BP）的各向异性二维半导体中的单声子和双声子载流子散射理论。我们表明，在对比石墨烯，其中双声子过程中，由于弯曲声子的散射占主导地位，在任何实际相关的温度和独立的载流子浓度$n$，双声子散射BP是不太重要的，可以被认为是可以忽略不计的$n\gtrsim10^{13}$厘米$^{-2}$。然而，在较小的$n$，声子进入基本上是非谐的制度。与在BP的主方向之间不表现出强各向异性的空穴迁移率（$μ_{xx}/μ_{yy}\sim1.4$ at $n=10^{13}$ cm $^{-2}$ and $T=300$ K）相比，发现电子迁移率显著更各向异性（$μ_{xx}/μ_{yy}\sim6.2$）。对于空穴（电子），$μ_{xx}$的绝对值不超过250（700）cm $^2$ V $^{-1}$ s $^{-1}$，这可以被认为是室温下BP中迁移率的上限。
A Comprehensive Study of Charge-Carrier Mobility in Double Lateral-Gate Silicon Junctionless Transistors
Laye Rooyan Part, Isfahan Science and Technology Town（拉耶鲁扬部分，伊斯法罕科技城）；Department of Physics, Isfahan University of Technology（伊斯法罕理工大学物理系）；Institute of Microengineering and Nanoelectronics, Universiti Kebangsaan Malaysia（马来西亚国立大学微工程与纳米电子研究所）；Department of Electrical and Computer Engineering, University of Texas at Dallas（德克萨斯大学达拉斯分校电气与计算机工程系）
Turbostratic graphitic microstructures: electronically decoupled multilayer graphene devices with robust high charge carrier mobility
碳纳米材料由于其特殊的物理性质继续令科学家感到惊讶。最近已经有理论预测和石墨烯多层膜的第一次报告，其中，由于堆叠层的旋转，保持了出色的电子性能，同时由于多层性质，对降解和机械应力的敏感性大大降低。在这里，我们表明，完全乱层多层石墨微结构结合了先进的电子和自旋电子器件所需的高载流子迁移率与石墨结构的鲁棒性。使用拉曼光谱和透射电子显微镜（TEM）的盘形石墨微结构的结构表征揭示了莫尔和衍射图案证实其乱层性质。电子输运特性产生了可重复的高迁移率，> 105 cm ^2（Vs）^（-1），与盘的厚度无关，这是乱层堆积引起的电子去耦的直接结果。
Realization of Room-Temperature Phonon-limited Carrier Transport in Monolayer MoS2 by Dielectric and Carrier Screening
我们发现，通过结合高k介质衬底和高密度的载流子，库仑杂质可以有效地屏蔽，导致前所未有的室温迁移率约150 cm 2/Vs的单层二硫化钼。高质量的样品使我们能够定量提取受库仑杂质、本征和表面光学声子限制的迁移率分量，并研究它们随温度、载流子密度和介电常数的变化。我们的理论分析和实验数据之间的良好的协议明确表明，室温声子限制的传输实现在单层二硫化钼，这是电子器件应用的必要因素。
Experimental realization of single-layer MoSi2N4 is among the latest groundbreaking advances in the field of two-dimensional (2D) materials. Inspired by this accomplishment, herein we conduct first-principles calculations to explore the stability of MC2N4 (M= Cr, Mo, W, V, Nb, Ta, Ti, Zr, Hf) monolayers. Acquired results confirm the desirable thermal, dynamical and mechanical stability of MC2N4 (M= Cr, Mo, W, V) nanosheets. Interestingly, CrC2N4, MoC2N4 and WC2N4 monolayers are found to be semiconductors with band gaps of 2.32, 2.76 and 2.86 eV, respectively, using the HSE06 functional, wherea…
