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arXiv 1010.0604cond-mat.mtrl-sci
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邻位衬底上双金属BiFeO3薄膜的铁电畴标度和电子性质

Ferroelectric domain scaling and electronic properties in ultrathin BiFeO3 films on vicinal substrates

Vilas Shelke, Dipanjan Mazumdar, Sergey Faleev, Oleg Mryasov, Stephen Jesse, Sergei Kalinin, Arthur Baddorf, Arunava Gupta

摘要:

我们报告电切换极化和铁电畴缩放在5 - 100 nm的厚度范围内的BiFeO3薄膜沉积在[110]邻位衬底。采用脉冲激光沉积技术沉积了不同厚度的BiFeO3薄膜,底层为SrRuO3。这些膜具有分形畴图案,畴宽度与膜厚度的平方根密切相关,符合Landau-Lifschitz-Kittel(LLK)定律。压电响应力显微镜的开关光谱为所有薄膜的铁电开关行为提供了明确的证据。利用准粒子自洽GW(QPGW)近似,我们研究了与直接隧穿行为有关的物理参数,即电子的有效质量和有效势垒高度。对于菱形BFO,我们报告了一个大的有效势垒高度值为3.6 eV,这是在合理的协议与纳米级的运输测量。QPGW研究具有P4mm对称性的四面体BFO结构揭示了0.38 eV的势垒高度,与其菱形对应物相比显著更低。这种差异对近四方BFO相的输运性质具有非常重要的影响。

英文摘要:

We report electrically switchable polarization and ferroelectric domain scaling over a thickness range of 5-100 nm in BiFeO3 films deposited on [110] vicinal substrates. The BiFeO3 films of variable thickness were deposited with SrRuO3 bottom layer using pulsed laser deposition technique. These films have fractal domain patterns and the domain width scales closely with the square root of film thickness, in accordance with the Landau-Lifschitz-Kittel (LLK) law. The Switching Spectroscopy Piezo-response Force Microscopy provides clear evidence for the ferroelectric switching behavior in all the films. Using Quasi-particle Self-consistent GW (QPGW) approximation we have investigated physical parameters relevant for direct tunneling behavior, namely the effective mass and effective barrier height of electrons. For rhombohedral BFO, we report a large effective barrier height value of 3.6 eV, which is in reasonable agreement with nanoscale transport measurements. QPGW investigations into the tetragonal BFO structure with P4mm symmetry revealed a barrier height of 0.38 eV, significantly lower compared to its rhombohedral counterpart. This difference has very significant implications on the transport properties of nearly tetragonal BFO phase.

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