arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1003.3073cond-mat.str-elcond-mat.mtrl-sci
收藏

Strain-mediated metal-insulator transition in epitaxial ultra-thin films of NdNiO3

Jian Liu, M. Kareev, B. Gray, J. W. Kim, P. Ryan, B. Dabrowski, J. W. Freeland, J. Chakhalian

英文摘要:

We have synthesized epitaxial NdNiO$_{3}$ ultra-thin films in a layer-by-layer growth mode under tensile and compressive strain on SrTiO$_{3}$ (001) and LaAlO$_3$ (001), respectively. A combination of X-ray diffraction, temperature dependent resistivity, and soft X-ray absorption spectroscopy has been applied to elucidate electronic and structural properties of the samples. In contrast to the bulk NdNiO$_{3}$, the metal-insulator transition under compressive strain is found to be completely quenched, while the transition remains under the tensile strain albeit modified from the bulk behavior.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑