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arXiv 1002.2692cond-mat.mtrl-sci
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硅表面的纳米拉曼光谱

Nano-Raman spectroscopy of silicon surfaces

P. G. Spizzirri, J. -H. Fang, S. Rubanov, E. Gauja, S. Prawer

摘要:

近场增强纳米拉曼光谱已成功地用于探测使用标准晶片清洗和加工技术制备的硅的表面化学。结果表明,该测量的实用程序探测局部表面化学纳米环境具有非常高的灵敏度。观察到Si-H、F-Si-H和可能的B-O-Si的振动(拉伸)模式的增强与所施加的表面处理一致。纳米探针没有增强硅衬底的声子特征。

英文摘要:

Near-field enhanced, nano-Raman spectroscopy has been successfully used to probe the surface chemistry of silicon prepared using standard wafer cleaning and processing techniques. The results demonstrate the utility of this measurement for probing the local surface chemical nano-environment with very high sensitivity. Enhancements were observed for the vibrational (stretching) modes of Si-H, F-Si-H and possibly also B-O-Si consistent with the surface treatments applied. The nano-probes did not enhance the phononic features of the silicon substrate.

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