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arXiv 0912.0981cond-mat.mtrl-sci
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离子辐照对MeV薄膜结构和电输运性质的影响

Effect of 200 MeV Ag15+ ion irradiation on structural and electrical transport properties of Fe3O4 thin films

Ram Prakash, R. J. Choudhary, Shailja Tiwari, D. M. Phase, Ravi Kumar

摘要:

采用脉冲激光沉积法在MgO(100)和Si(100)单晶衬底上制备了Fe_3 O_4薄膜。在MgO衬底上生长的薄膜是c轴取向的外延生长,而在Si衬底上生长的薄膜是高度<111>取向的。膜厚度为150 nm。这些薄膜已被200 MeV的银离子辐照。我们研究了辐照对这些薄膜的结构和电输运性质的影响。辐照的注量值在5 × 1010离子/cm ~ 2至1 × 1012离子/cm ~ 2的范围内变化。我们比较了c轴取向的外延薄膜和非外延但取向的薄膜的各种物理性质的辐照诱导的修改<111>。Si衬底上的原始膜显示接近125 K的Verwey转变(TV),这高于通常在单晶中观察到的(121 K)。在用5 × 1010离子/cm 2的能量密度值照射后,TV移到122 K,更接近单晶值。然而,随着更高的能量密度(1 × 1012离子/cm 2)照射,TV再次偏移到125 K。

英文摘要:

Thin films of Fe3O4 have been deposited on single crystal MgO (100) and Si (100) substrates using pulsed laser deposition. Films grown on MgO substrate are epitaxial with c-axis orientation whereas, films on Si substrate are highly <111> oriented. Film thicknesses are 150 nm. These films have been irradiated with 200 MeV Ag ions. We study the effect of the irradiation on structural and electrical transport properties of these films. The fluence value of irradiation has been varied in the range of 5 x 1010 ions/cm2 to1 x 1012 ions/cm2. We compare the irradiation induced modifications on various physical properties between the c-axis oriented epitaxial film and non epitaxial but <111> oriented film. The pristine film on Si substrate shows Verwey transition (TV) close to 125 K, which is higher than generally observed in single crystals (121 K). After the irradiation with the 5 x 1010 ions/cm2 fluence value, TV shifts to 122 K, closer to the single crystal value. However, with the higher fluence (1 x 1012 ions/cm2) irradiation, TV again shifts to 125 K.

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