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arXiv 0901.3965cond-mat.mtrl-sci
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W基电子束诱导沉积层在生长、辐照和暴露于空气中的瞬态电导率

Transient electrical conductivity of W-based electron beam induced deposits during growth, irradiation and exposure to air

F. Porrati, R. Sachser, M. Huth

摘要:

以六羰基钨为前驱体,采用电子束诱导沉积法制备了钨基金属颗粒。原位电导率测量已经进行监测的生长过程中,并调查下的电子束照射后,并通过暴露于空气中的沉积物的行为。在生长过程的第一部分期间,电导率非线性地增长,与电子束参数无关。这一行为被解释为W颗粒直径增加的结果。一旦生长过程终止,电导率随着时间的对数sigma ln(t)而降低。依赖于温度的电导率测量的存款揭示,电传输发生的方式,无论是W-金属颗粒之间或颗粒和陷阱网站之间的矩阵中的电子隧穿。在电子显微镜通风后,沉积物的电导率显示出劣化行为,这取决于组成。电子后辐照增加了沉积物的电导率。

英文摘要:

W-based granular metals have been prepared by electron beam induced deposition from the tungsten-hexacarbonyl W(CO)6 precursor. In situ electrical conductivity measurements have been performed to monitor the growth process and to investigate the behavior of the deposit under electron beam post irradiation and by exposure to air. During the first part of the growth process, the electrical conductivity grows non-linearly, independent of the electron beam parameters. This behavior is interpreted as the result of the increase of the W-particles diameter. Once the growth process is terminated, the electrical conductivity decreases with the logarithm of time, sigma ln(t). Temperature-dependent conductivity measurements of the deposits reveal that the electrical transport takes place by means of electron tunneling either between W-metal grains or between grains and trap sites in the matrix. After venting the electron microscope the electrical conductivity of the deposits shows a degradation behavior, which depends on the composition. Electron post-irradiation increases the electrical conductivity of the deposits.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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