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arXiv 0910.4485cond-mat.mtrl-scicond-mat.other
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NiO的能带结构

Band structure of NiO revisited

Luiz G. Ferreira, Lara K. Teles, Marcelo Marques

摘要:

作为NiO的强关联半导体的能带结构一直是许多争论的对象[PRL 103,036404(2009); PRL 102,226401(2009)]。大多数作者,使用计算技术远远超出了简单的密度泛函理论和近似GGA或LDA,声称带隙约为4.0 eV,导带是Ni-3d的性质。因此,他们似乎忘记了电子能量损失谱和非弹性X射线散射的结果,两者都能够确定电子跃迁只有约1.0 eV的光学禁止Ni-3d带。此外,Ni++自旋翻转能量的简单原子计算表明,在4.0 eV的Ni-3d带是不可能的。为了解决这个问题,我们用PRB 78,125116(2008)中非常成功的技术计算了NiO。结果表明,在4.0 eV处的带是光学可达的,并且由激发原子态组成,而不是Ni-3d。除此之外,我们还发现了一个窄的Ni-3d带在约1.0 eV。为了再次证实我们的程序,我们还计算了MnO,并获得了上述良好计算和实验的标准结果。

英文摘要:

The band structure of a strongly correlated semiconductor as NiO has been the object of much debate [PRL 103, 036404 (2009); PRL 102, 226401 (2009)]. Most authors, using computational techniques well beyond the simple density functional theory and the approximations GGA or LDA, claim that the band gap is about 4.0 eV and that the conduction band is of Ni-3d nature. Thus they seem to forget the results of electron energy-loss spectroscopy and inelastic x-ray scattering, both able to determine electronic transitions of only about 1.0 eV to an optically forbidden Ni-3d band. Further, a simple atomic calculation of the Ni++ spin flip energy demonstrates that a Ni-3d band at 4.0 eV is impossible. To set the issue straight, we calculated NiO with the very successful technique of PRB 78, 125116 (2008). It turns out that a band at 4.0 eV is optically accessible and made of excited atomic states, not Ni-3d. Aside from that, we also found a narrow Ni-3d band at about 1.0 eV. To confirm our procedures once again, we also calculated MnO and obtained the standard results of the good calculations as those cited above, and of experiment.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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