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arXiv 0906.0934cond-mat.mtrl-sci
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Ag/Al界面电阻率对界面混合的敏感性

Sensitivity of Ag/Al Interface Specific Resistances to Interfacial Intermixing

A. Sharma, N. Theodoropoulou, Shuai Wang, Ke Xia, W. P. Pratt, J. Bass

摘要:

我们已经测量到Ag/Al界面的电阻率,2AR(Ag/Al)(111)= 1.4 fOhm-m^2,这是完美界面时预测值的两倍,比2 ML 50%-50%合金的电阻率大50%,甚至比我们新预测的4 ML 50%-50%合金的电阻率1.3 fOhm^2还要大。如此大的2ARAg/Al(111)值证实了对界面无序的预测敏感性,并表明界面大于或等于4 ML厚。从我们的计算,预测的各向异性比,2AR(Ag/Al)(001)/2AR(Ag/Al)(111),大于4的一个完美的界面,应减少到小于2的4 ML界面,使其更难检测到任何这样的各向异性。

英文摘要:

We have measured an Ag/Al interface specific resistance, 2AR(Ag/Al)(111) = 1.4 fOhm-m^2, that is twice that predicted for a perfect interface, 50% larger than for a 2 ML 50%-50% alloy, and even larger than our newly predicted 1.3 fOhmm^2 for a 4 ML 50%-50% alloy. Such a large value of 2ARAg/Al(111) confirms a predicted sensitivity to interfacial disorder and suggests an interface greater than or equal to 4 ML thick. From our calculations, a predicted anisotropy ratio, 2AR(Ag/Al)(001)/2AR(Ag/Al)(111), of more then 4 for a perfect interface, should be reduced to less than 2 for a 4 ML interface, making it harder to detect any such anisotropy.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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