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arXiv 0903.2587cond-mat.str-elcond-mat.mes-hall
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杂质半导体中的Skyrmion晶格

Skyrmion Lattice in a Doped Semiconductor

W. Münzer, A. Neubauer, S. Mühlbauer, C. Franz, T. Adams, F. Jonietz, R. Georgii, P. Böni, B. Pedersen, M. Schmidt, A. Rosch, C. Pfleiderer

摘要:

我们报告了一个全面的小角中子散射研究(SANS)的磁相图的杂质半导体Fe_{1-x} Co_{x} Si的x=0.2和0.25。对于平行于中子束的磁场,我们观察到一个六倍的强度模式下的场冷却,这确定了A相的Fe_{1-x} Co_{x} Si作为一个skyrmion晶格。该制度的skyrmion晶格是高度滞后的,并在很宽的温度范围内的程度,与Fe和Co原子的网站无序。我们的研究确定了Fe_{1-x} Co_{x} Si是MnSi之后的第二种材料,其中形成了skyrmion晶格,并确定了skyrmion晶格也可能出现在强杂质半导体中。

英文摘要:

We report a comprehensive small angle neutron scattering study (SANS) of the magnetic phase diagram of the doped semiconductor Fe_{1-x}Co_{x}Si for x=0.2 and 0.25. For magnetic field parallel to the neutron beam we observe a six-fold intensity pattern under field-cooling, which identifies the A-phase of Fe_{1-x}Co_{x}Si as a skyrmion lattice. The regime of the skyrmion lattice is highly hysteretic and extents over a wide temperature range, consistent with the site disorder of the Fe and Co atoms. Our study identifies Fe_{1-x}Co_{x}Si is a second material after MnSi in which a skyrmion lattice forms and establishes that skyrmion lattices may also occur in strongly doped semiconductors.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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