用于电测量的具有非常大的纵横比的纳米间隙
Nanogaps with very large aspect ratios for electrical measurements
摘要：
对于纳米级电表征和器件制造，通常期望制造由大纵横比间隙隔开的平面金属电极，电极间距离远低于100 nm。我们展示了一个自对准的过程来实现这一目标，使用薄铬膜作为牺牲蚀刻层。所得的间隙可以小至10 nm，纵横比超过1000，具有优异的极间隔离。这种Ti/Au电极在Si衬底上进行了演示，并用于检查磁铁矿纳米结构中的电压驱动转变。这显示了这种制造方法的实用性，即使是相对反应性的基板。
英文摘要：
For nanoscale electrical characterization and device fabrication it is often desirable to fabricate planar metal electrodes separated by large aspect ratio gaps with interelectrode distances well below 100 nm. We demonstrate a self-aligned process to accomplish this goal using a thin Cr film as a sacrificial etch layer. The resulting gaps can be as small as 10 nm and have aspect ratios exceeding 1000, with excellent interelectrode isolation. Such Ti/Au electrodes are demonstrated on Si substrates and are used to examine a voltage-driven transition in magnetite nanostructures. This shows the utility of this fabrication approach even with relatively reactive substrates.
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