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arXiv 0802.0867cond-mat.mtrl-sci
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X射线光电子发射显微术结合X射线磁圆二色性研究场致Néel帽反转的尺寸效应

X-ray photoelectron emission microscopy in combination with x-ray magnetic circular dichroism investigation of size effects on field-induced Néel-cap reversal

Fabien Cheynis, Nicolas Rougemaille, Rachid Belkhou, Jean-Christophe Toussaint, Olivier Fruchart

摘要:

结合X射线磁性圆二色性的X射线光电子发射显微术用于研究施加的磁场对Néel帽的影响(即,不对称布洛赫壁的表面终止)。自组装的微米级Fe(110)点显示出适度的大小和纵横比的分布作为模型对象。沿着Néel帽磁化方向施加磁场后的Rexons状态的研究给出了Néel帽在120 mT左右的磁化反转的明确证据,其中$\pm$ 20 mT分散。在反向场的值和点的几何特征之间没有明显的相关性。

英文摘要:

X-ray photoelectron emission microscopy in combination with x-ray magnetic circular dichroism is used to investigate the influence of an applied magnetic field on Néel caps (i.e., surface terminations of asymmetric Bloch walls). Self-assembled micron-sized Fe(110) dots displaying a moderate distribution of size and aspect ratios serve as model objects. Investigations of remanent states after application of an applied field along the direction of Néel-cap magnetization give clear evidence for the magnetization reversal of the Néel caps around 120 mT, with a $\pm$20 mT dispersion. No clear correlation could be found between the value of the reversal field and geometrical features of the dots.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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