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arXiv 0709.0692cond-mat.str-elcond-mat.mtrl-sci
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V2O3薄膜电子性质的厚度依赖性

Thickness-dependence of the electronic properties in V2O3 thin films

C. Grygiel, Ch. Simon, B. Mercey, W. Prellier, P. Limelette, R. Fresard

摘要:

采用脉冲激光沉积技术在(0001)取向蓝宝石衬底上生长了高质量的V2 O3薄膜(170-1100 nm),研究了薄膜厚度对薄膜晶格应变和电学性质的影响。X射线衍射表明,存在面内压缩晶格参数(a),相对于衬底接近-3.5%,以及面外拉伸晶格参数(c)。薄膜样品在2-300 K温度范围内表现出金属特性,没有观察到金属-绝缘体转变。在低温下,V2 O3薄膜表现为强关联金属,电阻率(ρ)符合方程ρ=ρ_0 + AT^2,其中A为费米液体中的输运系数。计算出A的典型值为0.14 μΩcm K^{-2},与文献报道的V_2O_3单晶高压下的A系数一致。此外,霍尔电阻的强温度依赖性证实了这些V2 O3薄膜样品的电子相关性。

英文摘要:

High quality vanadium sesquioxide V2O3 films (170-1100 Å) were grown using the pulsed laser deposition technique on (0001)-oriented sapphire substrates, and the effects of film thickness on the lattice strain and electronic properties were examined. X-ray diffraction indicates that there is an in-plane compressive lattice parameter (a), close to -3.5% with respect to the substrate and an out-of-plane tensile lattice parameter (c) . The thin film samples display metallic character between 2-300 K, and no metal-to-insulator transition is observed. At low temperature, the V2O3 films behave as a strongly correlated metal, and the resistivity (ρ) follows the equation ρ=ρ_0 + A T^2, where A is the transport coefficient in a Fermi liquid. Typical values of A have been calculated to be 0.14 μΩcm K^{-2}, which is in agreement with the coefficient reported for V2O3 single crystals under high pressure. Moreover, a strong temperature-dependence of the Hall resistance confirms the electronic correlations of these V2O3 thin films samples.

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