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arXiv 0705.2079quant-ph
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硅中单施主自旋的高精度量子控制

High precision quantum control of single donor spins in silicon

Rajib Rahman, Cameron J. Wellard, Forrest R. Bradbury, Marta Prada, Jared H. Cole, Gerhard Klimeck, Lloyd C. L. Hollenberg

摘要:

利用紧束缚和能带极小基方法研究了Si中P施主远低于电离区的超精细耦合常数的Stark位移,并与最近的精密测量结果进行了比较. TB电子结构计算包括超过300万个原子。与以前的有效质量为基础的结果相比,从两个理论得到的二次斯塔克系数与实验吻合得很好。这项工作代表了单施主自旋控制的理论和实验之间最灵敏和精确的比较。它还表明,有一个显着的线性斯塔克效应附近的接口的杂质,而远离接口,二次斯塔克效应占主导地位。单施主自旋态的精确控制在单施主电子学的量子计算应用中特别需要,这形成了本工作的驱动动机。

英文摘要:

The Stark shift of the hyperfine coupling constant is investigated for a P donor in Si far below the ionization regime in the presence of interfaces using Tight-binding and Band Minima Basis approaches and compared to the recent precision measurements. The TB electronic structure calculations included over 3 million atoms. In contrast to previous effective mass based results, the quadratic Stark coefficient obtained from both theories agrees closely with the experiments. This work represents the most sensitive and precise comparison between theory and experiment for single donor spin control. It is also shown that there is a significant linear Stark effect for an impurity near the interface, whereas, far from the interface, the quadratic Stark effect dominates. Such precise control of single donor spin states is required particularly in quantum computing applications of single donor electronics, which forms the driving motivation of this work.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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