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arXiv 1408.4375cond-mat.mes-hallquant-ph
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硅中浅施主的超精细斯塔克效应

Hyperfine Stark effect of shallow donors in silicon

G. Pica, G. Wolfowicz, M. Urdampilleta, M. L. W. Thewalt, H. Riemann, N. V. Abrosimov, P. Becker, H. -J. Pohl, J. J. L. Morton, R. N. Bhatt, S. A. Lyon, B. W. Lovett

摘要:

我们提出了一个完整的理论处理的斯塔克效应在掺杂硅,其预测支持的实验测量。一个多谷有效质量理论,处理非微扰与谷轨道相互作用引起的施主依赖的中央电池的潜力,使我们能够获得一个非常可靠的图片的施主波函数在一个相对简单的框架。用一个新的试验波函数计算的1s施主结合能的变分优化,在赝势与两个拟合参数,允许实验确定的施主能级的准确匹配,而正确的限制行为的电子密度,无论是接近和远离每个杂质核,被捕获通过拟合测得的接触超精细耦合之间的施主核和电子自旋。我们继续包括一个外部均匀的电场,以模型斯塔克物理:没有额外的特设参数,变分最小化的完整的施主基态能量允许在每个杂质核的场诱导的电子密度的减少定量描述。与实验值的接触超精细耦合的位移的详细比较显示非常接近的协议,所有的捐助者测量(P,As,Sb和Bi)。最后,我们估计的施主基态的场电离阈值,从而设置上限的门操作时间为单量子位操作在凯恩类架构:硅:铋系统被证明允许A门快约10 MHz。

英文摘要:

We present a complete theoretical treatment of Stark effects in doped silicon, whose predictions are supported by experimental measurements. A multi-valley effective mass theory, dealing non-perturbatively with valley-orbit interactions induced by a donor-dependent central cell potential, allows us to obtain a very reliable picture of the donor wave function within a relatively simple framework. Variational optimization of the 1s donor binding energies calculated with a new trial wave function, in a pseudopotential with two fitting parameters, allows an accurate match of the experimentally determined donor energy levels, while the correct limiting behavior for the electronic density, both close to and far from each impurity nucleus, is captured by fitting the measured contact hyperfine coupling between the donor nuclear and electron spin. We go on to include an external uniform electric field in order to model Stark physics: With no extra ad hoc parameters, variational minimization of the complete donor ground energy allows a quantitative description of the field-induced reduction of electronic density at each impurity nucleus. Detailed comparisons with experimental values for the shifts of the contact hyperfine coupling reveal very close agreement for all the donors measured (P, As, Sb and Bi). Finally, we estimate field ionization thresholds for the donor ground states, thus setting upper limits to the gate manipulation times for single qubit operations in Kane-like architectures: the Si:Bi system is shown to allow for A gates as fast as around 10 MHz.

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