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arXiv physics/0206032physics.plasm-ph
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平面微波反应器中脉冲氢等离子体的朗缪尔探针诊断研究

Langmuir probe diagnostic studies of pulsed hydrogen plasmas in planar microwave reactors

A. Rousseau, E. Teboul, N. Lang, M. Hannemann, J. Röpcke

摘要:

朗缪尔探针技术已被用来研究时间和空间分辨的电子密度和电子温度的脉冲调制氢放电在两个不同的平面微波反应器(fmicrowave= 2.45 GHz,tpulse= 1 ms)。反应器是(i)驻波辐射开槽波导反应器和(ii)改进的行波辐射开槽波导反应器,它们在约350 cm ^2至500 cm ^2的面积上产生相对较大的等离子体。这些反应器类型的等离子体特性特别令人感兴趣,因为它们已用于基础研究和等离子体处理,例如用于表面处理和层沉积。在本研究中,反应器中的压力和微波功率分别在33和55 Pa和600和3600 W之间变化。在具有高电磁场的区域中,使用屏蔽的朗缪尔探针以避免探针特性的干扰。靠近反应器的微波窗口,电子密度和电子温度都表现出强烈的不均匀性。在驻波反应器的不均匀性被发现是空间调制的位置的槽。电子温度的最大值约为10 eV,电子密度在0.2 ~ 14*10^11 cm^-3之间变化。放电脉冲中的稳态电子温度在几十微秒内达到,而电子密度需要几百微秒才能达到稳态。取决于反应器,电子密度在脉冲开始后的80至200微秒之间达到最大值。

英文摘要:

Langmuir probe techniques have been used to study time and spatially resolved electron densities and electron temperatures in pulse-modulated hydrogen discharges in two different planar microwave reactors (fmicrowave= 2.45 GHz, tpulse= 1 ms). The reactors are (i) a standing-wave radiative slotted waveguide reactor and (ii) a modified travelling-wave radiative slotted waveguide reactor, which generate relatively large plasmas over areas from about 350 cm^2 to 500 cm^2. The plasma properties of these reactor types are of particular interest as they have been used for basic research and for plasma processing, e.g. for surface treatment and layer deposition. In the present study the pressures and microwave powers in the reactors were varied between 33 and 55 Pa and 600 and 3600 W, respectively. In regions with high electromagnetic fields shielded Langmuir probes were used to avoid disturbances of the probe characteristic. Close to the microwave windows of the reactors both the electron density and the electron temperature showed strong inhomogeneities. In the standing-wave reactor the inhomogeneity was found to be spatially modulated by the position of the slots. The maximum value of the electron temperature was about 10 eV and the electron density varied between 0.2 and 14*10^11 cm^-3. The steady state electron temperature in a discharge pulse was reached within a few tens of microseconds whereas the electron density needed some hundreds of microseconds to reach a steady state. Depending on the reactor the electron density reached a maximum between 80 and 200 microseconds after the beginning of the pulse.

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