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arXiv 2507.08089quant-phcond-mat.mes-hallcond-mat.mtrl-sci
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使用基于氟的表面处理改善Transmon量子比特性能

Improving Transmon Qubit Performance with Fluorine-based Surface Treatments

Michael A. Gingras, Bethany M. Niedzielski, Kevin A. Grossklaus, Duncan Miller, Felipe Contipelli, Kate Azar, Luke D. Burkhart, Gregory Calusine, Daniel Davis, … 展开作者

Michael A. Gingras, Bethany M. Niedzielski, Kevin A. Grossklaus, Duncan Miller, Felipe Contipelli, Kate Azar, Luke D. Burkhart, Gregory Calusine, Daniel Davis, Renée DePencier Piñero, Jeffrey M. Gertler, Thomas M. Hazard, Cyrus F. Hirjibehedin, David K. Kim, Jeffrey M. Knecht, Alexander J. Melville, Christopher O'Connell, Robert A. Rood, Ali Sabbah, Hannah Stickler, Jonilyn L. Yoder, William D. Oliver, Mollie E. Schwartz, Kyle Serniak

AI总结:

本文提出使用两种基于氟的湿法刻蚀处理固定频率transmon量子比特Josephson结下方的硅表面,有效去除了锗残留物,将最高性能工艺的能量弛豫时间T1提升至334 μs,并揭示了金属-基底界面是微波损耗的主要来源。

摘要:

减少材料与工艺引入的退相干对于开发基于超导量子比特的实用级量子处理器至关重要。在此,我们报告了两种基于氟的湿法刻蚀的影响,我们用它们处理使用铝基底金属化制备的固定频率transmon量子比特中Josephson结(JJs)下方的硅表面。使用多种材料分析技术,我们证明这些表面处理可以去除由我们的JJ制造引入的锗残留物,而对整体工艺流程没有其他改变。这些表面处理显著改善了最高性能工艺的能量弛豫时间,其中位T1=334 μs,对应于品质因子Q=6.6×10^6。这一结果表明,在集成这些表面处理之前,JJs正下方的金属-基底界面是这些transmon量子比特电路中微波损耗的主要来源。此外,这项工作说明了如何将材料分析与量子器件性能指标结合使用,以改善超导量子比特的性能。

英文摘要:

Reducing materials and processing-induced decoherence is critical to the development of utility-scale quantum processors based on superconducting qubits. Here we report on the impact of two fluorine-based wet etches, which we use to treat the silicon surface underneath the Josephson junctions (JJs) of fixed-frequency transmon qubits made with aluminum base metallization. Using several materials analysis techniques, we demonstrate that these surface treatments can remove germanium residue introduced by our JJ fabrication with no other changes to the overall process flow. These surface treatments result in significantly improved energy relaxation times for the highest performing process, with median $T_1=334~μ$s, corresponding to quality factor $Q=6.6\times10^6$. This result suggests that the metal-substrate interface directly underneath the JJs was a major contributor to microwave loss in these transmon qubit circuits prior to integration of these surface treatments. Furthermore, this work illustrates how materials analysis can be used in conjunction with quantum device performance metrics to improve performance in superconducting qubits.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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