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arXiv 2301.04567cond-mat.mtrl-sciquant-ph
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最先进超导电路中钽表面氧化物的化学分布

Chemical profiles of the oxides on tantalum in state of the art superconducting circuits

Russell A. McLellan, Aveek Dutta, Chenyu Zhou, Yichen Jia, Conan Weiland, Xin Gui, Alexander P. M. Place, Kevin D. Crowley, Xuan Hoang Le, Trisha Madhavan, Youq… 展开作者

Russell A. McLellan, Aveek Dutta, Chenyu Zhou, Yichen Jia, Conan Weiland, Xin Gui, Alexander P. M. Place, Kevin D. Crowley, Xuan Hoang Le, Trisha Madhavan, Youqi Gang, Lukas Baker, Ashley R. Head, Iradwikanari Waluyo, Ruoshui Li, Kim Kisslinger, Adrian Hunt, Ignace Jarrige, Stephen A. Lyon, Andi M. Barbour, Robert J. Cava, Andrew A. Houck, Steven L. Hulbert, Mingzhao Liu, Andrew L. Walter, Nathalie P. de Leon

AI总结:

该研究利用变能量X射线光电子能谱分析超导电路中钽表面氧化物的化学分布,识别不同氧化态并探究化学处理对其影响,以理解器件微观损耗。

摘要:

在过去的几十年中,超导量子比特已成为实现量子处理器的主要硬件平台之一。因此,研究人员投入了大量精力来理解限制超导量子比特相干时间的损耗通道。一个主要的损耗来源被归因于存在于材料界面处的二能级系统。我们最近的研究表明,在transmon量子比特的电容器中用钽替代金属可创纪录地提高超导量子比特的弛豫时间和相干时间,这促使我们对钽表面进行详细研究。在本工作中,我们使用变能量X射线光电子能谱(VEXPS)研究了生长在c面蓝宝石上的钽薄膜表面的化学分布。我们识别了因暴露于空气而产生的原生氧化物中存在的钽的不同氧化态,并测量了它们随薄膜深度的分布。此外,我们展示了这些钽氧化态的体量和深度分布如何通过不同的化学处理而改变。通过将这些测量结果与量子器件的详细测量相关联,我们可以加深对微观器件损耗的理解。

英文摘要:

Over the past decades, superconducting qubits have emerged as one of the leading hardware platforms for realizing a quantum processor. Consequently, researchers have made significant effort to understand the loss channels that limit the coherence times of superconducting qubits. A major source of loss has been attributed to two level systems that are present at the material interfaces. We recently showed that replacing the metal in the capacitor of a transmon with tantalum yields record relaxation and coherence times for superconducting qubits, motivating a detailed study of the tantalum surface. In this work, we study the chemical profile of the surface of tantalum films grown on c-plane sapphire using variable energy X-ray photoelectron spectroscopy (VEXPS). We identify the different oxidation states of tantalum that are present in the native oxide resulting from exposure to air, and we measure their distribution through the depth of the film. Furthermore, we show how the volume and depth distribution of these tantalum oxidation states can be altered by various chemical treatments. By correlating these measurements with detailed measurements of quantum devices, we can improve our understanding of the microscopic device losses.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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