红外脉冲laser沉积法制备氮化钽超导薄膜
Fabrication of superconducting tantalum nitride thin films using infra-red pulsed laser deposition
摘要：
本文报道了用1064 nm脉冲激光沉积技术成功制备了超导氮化钽（TaN）薄膜。在MgO（100）单晶和氧化硅（SiO $_{2} $）衬底上沉积的厚度为$ \sim $ 100 nm的薄膜的超导转变温度分别为$\sim $ 8 K和6 K。这些膜的形貌进行了研究，使用原子力和扫描电子显微镜，揭示相当大的面积颗粒自由和光滑的表面，而膜的结构进行了研究，使用标准的$ θ-2 θ$和掠射角X-射线衍射技术。对于生长在MgO上的薄膜，观察到TaN的面心立方相，而生长在SiO $_{2} $上的薄膜表现出面心立方相以及单氮化物六方相。发现沉积在SiO $_{2} $上的TaN的转变温度比沉积在MgO上的TaN对沉积期间的氮气压力更敏感。
英文摘要：
We report the successful fabrication of superconducting tantalum nitride (TaN) thin films using a pulsed laser deposition technique with 1064 nm radiation. Films with thickness $ \sim $ 100 nm deposited on MgO (100) single crystals and on oxidized silicon (SiO$_{2} $) substrates exhibited a superconducting transition temperature of $\sim $ 8 K and 6 K, respectively. The topography of these films were investigated using atomic force and scanning electron microscopy, revealing fairly large area particulate free and smooth surfaces, while the structure of the films were investigated using standard $ θ-2 θ$ and glancing angle X-ray diffraction techniques. For films grown on MgO a face-centered cubic phase of TaN was observed, while films grown on SiO$_{2} $ exhibited the face-centered cubic and as well as a mononitride hexagonal phase. The transition temperature of the TaN deposited on SiO$_{2} $ was found to be more sensitive to the nitrogen pressure during deposition as compared to the TaN deposited on MgO.
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